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Number of items: 13.

Wessely, Frank and Ruland, Tino and Schwalke, Udo (2007):
Characterization of Carbon Nanotube Field Effect Transistor (CNTFET) Fabrication Process by Atomic Force Microscopy (AFM) and Conductive-AFM.
In: European Congress on Advanced Materials and Processes (EUROMAT), Nürnberg, Deutschland, 10.-13.09.2007, [Conference or Workshop Item]

Wessely, Frank and Ruland, Tino and Schwalke, Udo (2007):
Fabrication and Characterisation of Nanoscale Schottky-S/D-MOSFETs and Gated Nanowire Devices on Ultra Thin Body SOI Material.
In: European Congress on Advanced Materials and Processes (EUROMAT), Nürnberg, Deutschland, 10.-13.09.2007, [Conference or Workshop Item]

Rispal, Lorraine and Ruland, Tino and Stefanov, Yordan and Wessely, Frank and Schwalke, Udo (2006):
Conductive AFM Measurements on Carbon Nanotubes and Application for CNTFET Characterization.
In: ECS Transactions, pp. 441-448, 3, (2), [Online-Edition: http://dx.doi.org/10.1149/1.2356303],
[Article]

Rispal, Lorraine and Wessely, Frank and Stefanov, Yordan and Ruland, Tino and Schwalke, Udo (2006):
CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors.
In: IEEE EDS Workshop on Advanced Electron Devices, Fraunhofer-Institut IMS, Duisburg, Deutschland, 13.-14.06.2006, [Conference or Workshop Item]

Ruland, Tino and Endres, Ralf and Schwalke, Udo (2005):
Application of Porous Silicon 2D Photonic Crystals as On-chip Interconnects.
In: European Congress on Advanced Materials and Processes (EUROMAT), Prag, Tschechien, 05.-08.09.2005, [Conference or Workshop Item]

Ruland, Tino and Endres, Ralf and Schwalke, Udo (2005):
Nanoscale Electrical Characterization of Crystalline Praseodymium Oxide High-k Gate Dielectric MOSFETs with Conductive Atomic Force Microscopy.
In: European Congress on Advanced Materials and Processes (EUROMAT), Prag, Tschechien, 05.-08.09.2005, [Conference or Workshop Item]

Gottlob, H. D. B. and Lemme, M. C. and Mollenhauer, T. and Wahlbrink, T. and Efavi, J. K. and Kurz, H. and Stefanov, Yordan and Haberle, Klaus and Komaragiri, Rama Subrahmanyam and Ruland, Tino and Zaunert, Florian and Schwalke, Udo (2005):
Introduction of Crystalline High-k Gate Dielectrics in a CMOS Process.
In: Journal of Non-Crystalline Solids, pp. 1885-1889, 351, (21-23), [Online-Edition: http://dx.doi.org/10.1016/j.jnoncrysol.2005.04.032],
[Article]

Stefanov, Yordan and Ruland, Tino and Schwalke, Udo (2004):
Electrical AFM Measurements for Evaluation of Nitride Erosion in Shallow Trench Isolation Chemical Mechanical Planarization.
In: Proceedings of the MRS Fall Meeting 2004, [Article]

Ruland, Tino and Stefanov, Yordan and Rispal, Lorraine and Schwalke, Udo (2004):
Application of Atomic Force Microscopy in Resist Structure Evaluation.
In: VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik, (1860), [Article]

Stefanov, Yordan and Komaragiri, Rama Subrahmanyam and Ruland, Tino and Schwalke, Udo (2004):
Electrical AFM Measurements for STI CMP Erosion Evaluation.
In: Nanoscale International Conference: Abstracts, p. 97, [Article]

Schwalke, Udo and Stefanov, Yordan and Komaragiri, Rama Subrahmanyam and Ruland, Tino (2003):
Electrical Characterisation of Crystalline Praseodymium Oxide High-K Gate Dielectric MOSFETs.
In: Proceedings of the 33rd European Solid State Device Research Conference (ESSDERC), pp. 243-246, [Online-Edition: http://dx.doi.org/10.1109/ESSDERC.2003.1256859],
[Article]

Komaragiri, Rama Subrahmanyam and Schwalke, Udo and Stefanov, Yordan and Ruland, Tino (2003):
Comparison of Praseodymium Oxide Gate MOSFETs with Conventional SiO2 MOSFETs: A Simulation Study.
In: Proceedings of the International Workshop on Physics of Semiconductor Devices (IWPSD), [Article]

Schwalke, Udo and Boye, K. and Haberle, Klaus and Heller, Rudolf and Hess, Gisela and Müller, Gudrun and Ruland, Tino and Tzschöckel, Gerhard and Osten, H. J. and Fissel, A. and Müssig, H.-J. (2002):
Process Integration of Crystalline Pr2O3 High-k Gate Dielectrics.
In: Proceedings of 32nd European Solid State Device Research Conference (ESSDERC), pp. 407-410, [Online-Edition: http://dx.doi.org/10.1109/ESSDERC.2002.194954],
[Article]

This list was generated on Tue Jun 18 00:52:54 2019 CEST.