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Number of items: 6.

Jatta, Sandro and Haberle, Klaus and Klein, Andreas and Schafranek, Robert and Koegel, Benjamin and Meissner, Peter (2009):
Depositon of Dielectric Films with Inductively Coupled Plasma-CVD in Dependence on Pressure and Two RF-Power-Sources.
In: Plasma Processes and Polymers, pp. S582, 6, (S1), ISSN 16128850,
[Online-Edition: http://dx.doi.org/10.1002/ppap.200931405],
[Article]

Meissner, Peter and Jatta, Sandro and Haberle, Klaus and Koegel, Benjamin and Zogal, Karolina (2007):
Widely tuneable VCSELs.
In: Sino-German Symposium on Optical Communication Networks (SOCN), Berlin, Germany, Sept. 2007, [Conference or Workshop Item]

Meissner, Peter and Koegel, Benjamin and Halbritter, Hubert and Jatta, Sandro and Haberle, Klaus and Maute, Markus and Boehm, G. and Amann, Markus-Christian and Lackner, M. and Schwarzott, M. and Winter, W. (2006):
Micromechanically tuneable long wavelength VCSELs.
In: Proceedings of the Chitose International Forum on Photonics Science and Technology (CIFı7), Session I.3, Chitose, Hokkaido, Japan, Chitose, Hokkaido, Japan, November 2006. Invited, [Conference or Workshop Item]

Rispal, Lorraine and Stefanov, Yordan and Heller, Rudolf and Tzschöckel, Gerhard and Hess, Gisela and Haberle, Klaus and Schwalke, Udo (2005):
Topographic and Conductive AFM Measurements on Carbon Nanotube Field-Effect Transistors Fabricated by In-Situ Chemical Vapor Deposition.
In: International Conference on Solid State Devices and Materials (SSDM), Kobe, Japan, 12.-15.09.2005, [Conference or Workshop Item]

Gottlob, H. D. B. and Lemme, M. C. and Mollenhauer, T. and Wahlbrink, T. and Efavi, J. K. and Kurz, H. and Stefanov, Yordan and Haberle, Klaus and Komaragiri, Rama Subrahmanyam and Ruland, Tino and Zaunert, Florian and Schwalke, Udo (2005):
Introduction of Crystalline High-k Gate Dielectrics in a CMOS Process.
In: Journal of Non-Crystalline Solids, pp. 1885-1889, 351, (21-23), [Online-Edition: http://dx.doi.org/10.1016/j.jnoncrysol.2005.04.032],
[Article]

Schwalke, Udo and Boye, K. and Haberle, Klaus and Heller, Rudolf and Hess, Gisela and Müller, Gudrun and Ruland, Tino and Tzschöckel, Gerhard and Osten, H. J. and Fissel, A. and Müssig, H.-J. (2002):
Process Integration of Crystalline Pr2O3 High-k Gate Dielectrics.
In: Proceedings of 32nd European Solid State Device Research Conference (ESSDERC), pp. 407-410, [Online-Edition: http://dx.doi.org/10.1109/ESSDERC.2002.194954],
[Article]

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