Rispal, Lorraine and Wessely, Frank and Stefanov, Yordan and Ruland, Tino and Schwalke, Udo (2006):
CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors.
IEEE EDS Workshop on Advanced Electron Devices, Fraunhofer-Institut IMS, Duisburg, Deutschland, 13.-14.06.2006, [Conference or Workshop Item]
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 2006 |
| Creators: | Rispal, Lorraine and Wessely, Frank and Stefanov, Yordan and Ruland, Tino and Schwalke, Udo |
| Title: | CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors |
| Language: | English |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Event Title: | IEEE EDS Workshop on Advanced Electron Devices |
| Event Location: | Fraunhofer-Institut IMS, Duisburg, Deutschland |
| Event Dates: | 13.-14.06.2006 |
| Date Deposited: | 28 Jun 2011 06:06 |
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