TU Darmstadt / ULB / TUbiblio

CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors

Rispal, Lorraine and Wessely, Frank and Stefanov, Yordan and Ruland, Tino and Schwalke, Udo (2006):
CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors.
In: IEEE EDS Workshop on Advanced Electron Devices, Fraunhofer-Institut IMS, Duisburg, Deutschland, 13.-14.06.2006, [Conference or Workshop Item]

Item Type: Conference or Workshop Item
Erschienen: 2006
Creators: Rispal, Lorraine and Wessely, Frank and Stefanov, Yordan and Ruland, Tino and Schwalke, Udo
Title: CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors
Language: English
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: IEEE EDS Workshop on Advanced Electron Devices
Event Location: Fraunhofer-Institut IMS, Duisburg, Deutschland
Event Dates: 13.-14.06.2006
Date Deposited: 28 Jun 2011 06:06
Export:

Optionen (nur für Redakteure)

View Item View Item