Ruland, Tino and Stefanov, Yordan and Rispal, Lorraine and Schwalke, Udo (2004):
Application of Atomic Force Microscopy in Resist Structure Evaluation.
In: VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik, (1860), [Article]
| Item Type: | Article |
|---|---|
| Erschienen: | 2004 |
| Creators: | Ruland, Tino and Stefanov, Yordan and Rispal, Lorraine and Schwalke, Udo |
| Title: | Application of Atomic Force Microscopy in Resist Structure Evaluation |
| Language: | English |
| Journal or Publication Title: | VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik |
| Number: | 1860 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Event Title: | International Symposium on Measurement and Quality Control in Production |
| Event Location: | Erlangen, Deutschland |
| Event Dates: | 12.-15.10.2004 |
| Date Deposited: | 20 Nov 2008 08:20 |
| License: | [undefiniert] |
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