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Application of Atomic Force Microscopy in Resist Structure Evaluation

Ruland, Tino and Stefanov, Yordan and Rispal, Lorraine and Schwalke, Udo (2004):
Application of Atomic Force Microscopy in Resist Structure Evaluation.
In: VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik, (1860), [Article]

Item Type: Article
Erschienen: 2004
Creators: Ruland, Tino and Stefanov, Yordan and Rispal, Lorraine and Schwalke, Udo
Title: Application of Atomic Force Microscopy in Resist Structure Evaluation
Language: English
Journal or Publication Title: VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik
Number: 1860
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: International Symposium on Measurement and Quality Control in Production
Event Location: Erlangen, Deutschland
Event Dates: 12.-15.10.2004
Date Deposited: 20 Nov 2008 08:20
License: [undefiniert]
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