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Number of items: 25.

Keyn, Martin and Wessely, Pia Juliane and Wessely, Frank and Rispal, Lorraine and Palm, Johannes and Schwalke, Udo (2012):
Feasibility Study on In Situ CCVD Grown CNTs for Field-Effect Power Device Applications.
In: 7th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS), pp. 1-3, [Online-Edition: http://dx.doi.org/10.1109/DTIS.2012.6232952],
[Article]

Schwalke, Udo and Wessely, Pia Juliane and Wessely, Frank and Keyn, Martin and Rispal, Lorraine (2012):
Nanoelectronics: From Silicon to Graphene.
In: 7th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS), [Online-Edition: http://dx.doi.org/10.1109/DTIS.2012.6232951],
[Article]

Schwalke, Udo and Wessely, Pia Juliane and Wessely, Frank and Birinci, Emrah and Keyn, Martin and Rispal, Lorraine (2011):
In-situ CCVD Growth of Hexagonal Carbon for CMOS-Compatible Nanoelectronics: From Nanotube Field-Effect Devices to Graphene Transistors.
In: 12th Trends in Nanotechnology International Conference (TNT), Tenerife, Canary Islands, Spain, 21.-25.11.2011, [Online-Edition: http://www.tntconf.org/2011/abstracts_TNT2011/TNT2011_Schwal...],
[Conference or Workshop Item]

Schwalke, Udo and Rispal, Lorraine (2010):
Non-Volatile Memory Effect in Carbon Nanotube Field-Effect Transistors: Charge Trapping in AlxOy High-k Dielectrics Made from Sacrificial Metal Catalyst.
In: 41st IEEE Semiconductor Interface Specialists Conference (SISC), San Diego, CA, USA, 02.-04.12.2010, [Conference or Workshop Item]

Rispal, Lorraine and Ginsel, Pia Juliane and Schwalke, Udo (2010):
In Situ Growth of Carbon for Nanoelectronics: From Nanotubes to Graphene.
In: ECS Transactions, pp. 13-19, 33, (9), [Online-Edition: http://dx.doi.org/10.1149/1.3493679],
[Article]

Rispal, Lorraine (2009):
Large Scale Fabrication of Field-Effect Devices based on In Situ Grown Carbon Nanotubes.
Darmstadt, Deutschland, Darmstädter Dissertationen, Institut für Halbleitertechnik und Nanoelektronik, [Online-Edition: urn:nbn:de:tuda-tuprints-20210],
[Ph.D. Thesis]

Rispal, Lorraine and Schwalke, Udo (2009):
Carbon: The Future of Nanoelectronics.
In: 3rd International Conference on Signals, Circuits and Systems (SCS), [Online-Edition: http://dx.doi.org/10.1109/ICSCS.2009.5414197],
[Article]

Rispal, Lorraine and Schwalke, Udo (2009):
Carbon Nanotube Memory Devices: Mass-Fabrication and Electrical Characterization.
In: 216th Meeting of The Electrochemical Society (ECS), Wien, Österreich, 04.-09.10.2009, [Online-Edition: http://ecsdl.org/getpdf/servlet/GetPDFServlet?filetype=pdf&i...],
[Conference or Workshop Item]

Rispal, Lorraine and Schwalke, Udo (2008):
Large-Scale In Situ Fabrication of Voltage-Programmable Dual-Layer High-k Dielectric Carbon Nanotube Memory Devices With High On/Off Ratio.
In: IEEE Electron Device Letters, pp. 1349-1352, 29, (12), [Online-Edition: http://dx.doi.org/10.1109/LED.2008.2005850],
[Article]

Schwalke, Udo and Rispal, Lorraine (2008):
Mass-Fabrication of Voltage-Programmable Non-Volatile Carbon Nanotube Memory Devices.
In: 214th Meeting of The Electrochemical Society (ECS), Honolulu, HI, USA, 12.-17.10.2008, [Online-Edition: http://ecsdl.org/getpdf/servlet/GetPDFServlet?filetype=pdf&i...],
[Conference or Workshop Item]

Rispal, Lorraine and Tschischke, T. and Yang, Hongyu and Schwalke, Udo (2008):
Mass-Production of Passivated CNTFETs: Statistics and Gate-Field Dependence of Hysteresis Effect.
In: ECS Transactions, pp. 65-71, 13, (14), [Online-Edition: http://dx.doi.org/10.1149/1.2998532],
[Article]

Schwalke, Udo and Rispal, Lorraine (2008):
Fabrication of Ultra-Sensitive Carbon Nanotube Field-Effect Sensors (CNTFES) for Biomedical Applications.
In: ECS Transactions, pp. 39-45, 13, (22), [Online-Edition: http://dx.doi.org/10.1149/1.3005401],
[Article]

Rispal, Lorraine and Schwalke, Udo (2008):
Structural and Electrical Characterization of Carbon Nanotube Field-Effect Transistors Fabricated by Novel Self-aligned Growth Method.
In: 3rd International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS), [Online-Edition: http://dx.doi.org/10.1109/DTIS.2008.4540244],
[Article]

Rispal, Lorraine and Tschischke, T. and Yang, Hongyu and Schwalke, Udo (2008):
Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis.
In: Japanese Journal of Applied Physics, pp. 3287-3291, 47, (4), [Online-Edition: http://dx.doi.org/10.1143/JJAP.47.3287],
[Article]

Rispal, Lorraine and Hang, H. and Heller, Rudolf and Hess, Gisela and Tzschöckel, Gerhard and Schwalke, Udo (2007):
Self-Aligned Fabrication Process Based on Sacrificial Catalyst for Pd-Contacted Carbon Nanotube Field-Effect Transistors.
In: ECS Transactions, pp. 53-61, 11, (8), [Online-Edition: http://dx.doi.org/10.1149/1.2783302],
[Article]

Wessely, Frank and Rispal, Lorraine and Schwalke, Udo (2007):
Mix-and-Match Lithography Based Ultrathin-body SOI Nanowires and Schottky-S/D-FETs.
In: Proceedings of Semiconductor Advances for Future Electronics (SAFE), pp. 478-481, [Online-Edition: http://www.stw.nl/NR/rdonlyres/ADD2FB2C-3AD4-4D1E-BA0A-1EAEA...],
[Article]

Rispal, Lorraine and Yang, Hongyu and Heller, Rudolf and Hess, Gisela and Tzschöckel, Gerhard and Schwalke, Udo (2007):
Self-aligned Fabrication Process for Pd-Contacted and PMMA-Passivated Carbon Nanotube Field-Effect Transistors.
In: 2007 International Conference on Solid State Devices and Materials (SSDM), Tsukuba, Japan, 18.-21.09.2007, [Conference or Workshop Item]

Rispal, Lorraine and Schwalke, Udo (2007):
Fabrication-Process for CNTFETs Based on Sacrificial Catalyst: Device Characterization and Conductive-AFM Measurements.
In: Nanotech Northern Europe (NTNE), Helsinki, Finnland, 27.-29.03.2007, [Conference or Workshop Item]

Rispal, Lorraine and Ruland, Tino and Stefanov, Yordan and Wessely, Frank and Schwalke, Udo (2006):
Conductive AFM Measurements on Carbon Nanotubes and Application for CNTFET Characterization.
In: ECS Transactions, pp. 441-448, 3, (2), [Online-Edition: http://dx.doi.org/10.1149/1.2356303],
[Article]

Rispal, Lorraine and Wessely, Frank and Stefanov, Yordan and Ruland, Tino and Schwalke, Udo (2006):
CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors.
In: IEEE EDS Workshop on Advanced Electron Devices, Fraunhofer-Institut IMS, Duisburg, Deutschland, 13.-14.06.2006, [Conference or Workshop Item]

Rispal, Lorraine and Stefanov, Yordan and Wessely, Frank and Schwalke, Udo (2006):
Carbon Nanotube Transistor Fabrication Assisted by Topographical and Conductive Atomic Force Microscopy.
In: Japanese Journal of Applied Physics, pp. 3672-3679, 45, [Online-Edition: http://dx.doi.org/10.1143/JJAP.45.3672],
[Article]

Rispal, Lorraine and Stefanov, Yordan and Heller, Rudolf and Tzschöckel, Gerhard and Hess, Gisela and Haberle, Klaus and Schwalke, Udo (2005):
Topographic and Conductive AFM Measurements on Carbon Nanotube Field-Effect Transistors Fabricated by In-Situ Chemical Vapor Deposition.
In: International Conference on Solid State Devices and Materials (SSDM), Kobe, Japan, 12.-15.09.2005, [Conference or Workshop Item]

Rispal, Lorraine and Schwalke, Udo (2005):
Carbon Nanotube Devices Integrated in the CMOS Process Using Chemical Vapour Deposition.
In: European Congress on Advanced Materials and Processes (EUROMAT), Prag, Tschechien, 05.-08.09.2005, [Conference or Workshop Item]

Rispal, Lorraine and Stefanov, Yordan and Schwalke, Udo (2005):
Atomic Force Microscopy (AFM) and Electrical Characterization of Carbon Nanotube (CNT) Devices Fabricated by Chemical Vapour Deposition.
In: Nanoscale III, Santa Barbara, CA, USA, 13.-16.08.2005, [Conference or Workshop Item]

Ruland, Tino and Stefanov, Yordan and Rispal, Lorraine and Schwalke, Udo (2004):
Application of Atomic Force Microscopy in Resist Structure Evaluation.
In: VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik, (1860), [Article]

This list was generated on Tue Oct 15 01:35:24 2019 CEST.