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Number of items: 25.

Keyn, Martin ; Wessely, Pia Juliane ; Wessely, Frank ; Rispal, Lorraine ; Palm, Johannes ; Schwalke, Udo (2012)
Feasibility Study on In Situ CCVD Grown CNTs for Field-Effect Power Device Applications.
In: 7th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS)
Article, Bibliographie

Schwalke, Udo ; Wessely, Pia Juliane ; Wessely, Frank ; Keyn, Martin ; Rispal, Lorraine (2012)
Nanoelectronics: From Silicon to Graphene.
In: 7th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS)
Article, Bibliographie

Schwalke, Udo ; Wessely, Pia Juliane ; Wessely, Frank ; Birinci, Emrah ; Keyn, Martin ; Rispal, Lorraine (2011)
In-situ CCVD Growth of Hexagonal Carbon for CMOS-Compatible Nanoelectronics: From Nanotube Field-Effect Devices to Graphene Transistors.
12th Trends in Nanotechnology International Conference (TNT). Tenerife, Canary Islands, Spain (21.-25.11.2011)
Conference or Workshop Item, Bibliographie

Schwalke, Udo ; Rispal, Lorraine (2010)
Non-Volatile Memory Effect in Carbon Nanotube Field-Effect Transistors: Charge Trapping in AlxOy High-k Dielectrics Made from Sacrificial Metal Catalyst.
41st IEEE Semiconductor Interface Specialists Conference (SISC). San Diego, CA, USA (02.-04.12.2010)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Ginsel, Pia Juliane ; Schwalke, Udo (2010)
In Situ Growth of Carbon for Nanoelectronics: From Nanotubes to Graphene.
In: ECS Transactions, 33 (9)
Article, Bibliographie

Rispal, Lorraine (2009)
Large Scale Fabrication of Field-Effect Devices based on In Situ Grown Carbon Nanotubes.
Technische Universität Darmstadt
Ph.D. Thesis, Primary publication

Rispal, Lorraine ; Schwalke, Udo (2009)
Carbon: The Future of Nanoelectronics.
In: 3rd International Conference on Signals, Circuits and Systems (SCS)
Article, Bibliographie

Rispal, Lorraine ; Schwalke, Udo (2009)
Carbon Nanotube Memory Devices: Mass-Fabrication and Electrical Characterization.
216th Meeting of The Electrochemical Society (ECS). Wien, Österreich (04.-09.10.2009)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Schwalke, Udo (2008)
Large-Scale In Situ Fabrication of Voltage-Programmable Dual-Layer High-k Dielectric Carbon Nanotube Memory Devices With High On/Off Ratio.
In: IEEE Electron Device Letters, 29 (12)
Article, Bibliographie

Schwalke, Udo ; Rispal, Lorraine (2008)
Mass-Fabrication of Voltage-Programmable Non-Volatile Carbon Nanotube Memory Devices.
214th Meeting of The Electrochemical Society (ECS). Honolulu, HI, USA (12.-17.10.2008)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Tschischke, T. ; Yang, Hongyu ; Schwalke, Udo (2008)
Mass-Production of Passivated CNTFETs: Statistics and Gate-Field Dependence of Hysteresis Effect.
In: ECS Transactions, 13 (14)
Article, Bibliographie

Schwalke, Udo ; Rispal, Lorraine (2008)
Fabrication of Ultra-Sensitive Carbon Nanotube Field-Effect Sensors (CNTFES) for Biomedical Applications.
In: ECS Transactions, 13 (22)
Article, Bibliographie

Rispal, Lorraine ; Schwalke, Udo (2008)
Structural and Electrical Characterization of Carbon Nanotube Field-Effect Transistors Fabricated by Novel Self-aligned Growth Method.
In: 3rd International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS)
Article, Bibliographie

Rispal, Lorraine ; Tschischke, T. ; Yang, Hongyu ; Schwalke, Udo (2008)
Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis.
In: Japanese Journal of Applied Physics, 47 (4)
Article, Bibliographie

Rispal, Lorraine ; Hang, H. ; Heller, Rudolf ; Hess, Gisela ; Tzschöckel, Gerhard ; Schwalke, Udo (2007)
Self-Aligned Fabrication Process Based on Sacrificial Catalyst for Pd-Contacted Carbon Nanotube Field-Effect Transistors.
In: ECS Transactions, 11 (8)
Article, Bibliographie

Wessely, Frank ; Rispal, Lorraine ; Schwalke, Udo (2007)
Mix-and-Match Lithography Based Ultrathin-body SOI Nanowires and Schottky-S/D-FETs.
In: Proceedings of Semiconductor Advances for Future Electronics (SAFE)
Article, Bibliographie

Rispal, Lorraine ; Yang, Hongyu ; Heller, Rudolf ; Hess, Gisela ; Tzschöckel, Gerhard ; Schwalke, Udo (2007)
Self-aligned Fabrication Process for Pd-Contacted and PMMA-Passivated Carbon Nanotube Field-Effect Transistors.
2007 International Conference on Solid State Devices and Materials (SSDM). Tsukuba, Japan (18.-21.09.2007)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Schwalke, Udo (2007)
Fabrication-Process for CNTFETs Based on Sacrificial Catalyst: Device Characterization and Conductive-AFM Measurements.
Nanotech Northern Europe (NTNE). Helsinki, Finnland (27.-29.03.2007)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Ruland, Tino ; Stefanov, Yordan ; Wessely, Frank ; Schwalke, Udo (2006)
Conductive AFM Measurements on Carbon Nanotubes and Application for CNTFET Characterization.
In: ECS Transactions, 3 (2)
Article, Bibliographie

Rispal, Lorraine ; Wessely, Frank ; Stefanov, Yordan ; Ruland, Tino ; Schwalke, Udo (2006)
CMOS-compatible Fabrication Process of Carbon-Nanotube-Field-Effect Transistors.
IEEE EDS Workshop on Advanced Electron Devices. Fraunhofer-Institut IMS, Duisburg, Deutschland (13.-14.06.2006)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Stefanov, Yordan ; Wessely, Frank ; Schwalke, Udo (2006)
Carbon Nanotube Transistor Fabrication Assisted by Topographical and Conductive Atomic Force Microscopy.
In: Japanese Journal of Applied Physics, 45
Article, Bibliographie

Rispal, Lorraine ; Stefanov, Yordan ; Heller, Rudolf ; Tzschöckel, Gerhard ; Hess, Gisela ; Haberle, Klaus ; Schwalke, Udo (2005)
Topographic and Conductive AFM Measurements on Carbon Nanotube Field-Effect Transistors Fabricated by In-Situ Chemical Vapor Deposition.
International Conference on Solid State Devices and Materials (SSDM). Kobe, Japan (12.-15.09.2005)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Schwalke, Udo (2005)
Carbon Nanotube Devices Integrated in the CMOS Process Using Chemical Vapour Deposition.
European Congress on Advanced Materials and Processes (EUROMAT). Prag, Tschechien (05.-08.09.2005)
Conference or Workshop Item, Bibliographie

Rispal, Lorraine ; Stefanov, Yordan ; Schwalke, Udo (2005)
Atomic Force Microscopy (AFM) and Electrical Characterization of Carbon Nanotube (CNT) Devices Fabricated by Chemical Vapour Deposition.
Nanoscale III. Santa Barbara, CA, USA (13.-16.08.2005)
Conference or Workshop Item, Bibliographie

Ruland, Tino ; Stefanov, Yordan ; Rispal, Lorraine ; Schwalke, Udo (2004)
Application of Atomic Force Microscopy in Resist Structure Evaluation.
In: VDI/VDE-Gesellschaft Mess- und Automatisierungstechnik, (1860)
Article, Bibliographie

This list was generated on Sat Oct 12 01:59:26 2024 CEST.