Rispal, Lorraine and Tschischke, T. and Yang, Hongyu and Schwalke, Udo (2008):
Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis.
In: Japanese Journal of Applied Physics, pp. 3287-3291, 47, (4), [Online-Edition: http://dx.doi.org/10.1143/JJAP.47.3287],
[Article]
Official URL: http://dx.doi.org/10.1143/JJAP.47.3287
| Item Type: | Article |
|---|---|
| Erschienen: | 2008 |
| Creators: | Rispal, Lorraine and Tschischke, T. and Yang, Hongyu and Schwalke, Udo |
| Title: | Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis |
| Language: | English |
| Journal or Publication Title: | Japanese Journal of Applied Physics |
| Volume: | 47 |
| Number: | 4 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 29 Jun 2011 10:37 |
| Official URL: | http://dx.doi.org/10.1143/JJAP.47.3287 |
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| Suche nach Titel in: | TUfind oder in Google |
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