Rispal, Lorraine and Tschischke, T. and Yang, Hongyu and Schwalke, Udo (2008):
Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis.
In: Japanese Journal of Applied Physics, 47 (4), pp. 3287-3291. [Article]
Official URL: http://dx.doi.org/10.1143/JJAP.47.3287
Item Type: | Article |
---|---|
Erschienen: | 2008 |
Creators: | Rispal, Lorraine and Tschischke, T. and Yang, Hongyu and Schwalke, Udo |
Title: | Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis |
Language: | English |
Journal or Publication Title: | Japanese Journal of Applied Physics |
Journal volume: | 47 |
Number: | 4 |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
Date Deposited: | 29 Jun 2011 10:37 |
Official URL: | http://dx.doi.org/10.1143/JJAP.47.3287 |
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