Wessely, Frank and Rispal, Lorraine and Schwalke, Udo (2007):
Mix-and-Match Lithography Based Ultrathin-body SOI Nanowires and Schottky-S/D-FETs.
In: Proceedings of Semiconductor Advances for Future Electronics (SAFE), pp. 478-481, [Online-Edition: http://www.stw.nl/NR/rdonlyres/ADD2FB2C-3AD4-4D1E-BA0A-1EAEA...],
[Article]
| Item Type: | Article |
|---|---|
| Erschienen: | 2007 |
| Creators: | Wessely, Frank and Rispal, Lorraine and Schwalke, Udo |
| Title: | Mix-and-Match Lithography Based Ultrathin-body SOI Nanowires and Schottky-S/D-FETs |
| Language: | English |
| Journal or Publication Title: | Proceedings of Semiconductor Advances for Future Electronics (SAFE) |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Event Title: | 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE) |
| Event Location: | Veldhoven, Niederlande |
| Event Dates: | 29.-30.09.2007 |
| Date Deposited: | 20 Nov 2008 08:28 |
| Official URL: | http://www.stw.nl/NR/rdonlyres/ADD2FB2C-3AD4-4D1E-BA0A-1EAEA... |
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