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Mix-and-Match Lithography Based Ultrathin-body SOI Nanowires and Schottky-S/D-FETs

Wessely, Frank and Rispal, Lorraine and Schwalke, Udo (2007):
Mix-and-Match Lithography Based Ultrathin-body SOI Nanowires and Schottky-S/D-FETs.
In: Proceedings of Semiconductor Advances for Future Electronics (SAFE), pp. 478-481, [Online-Edition: http://www.stw.nl/NR/rdonlyres/ADD2FB2C-3AD4-4D1E-BA0A-1EAEA...],
[Article]

Item Type: Article
Erschienen: 2007
Creators: Wessely, Frank and Rispal, Lorraine and Schwalke, Udo
Title: Mix-and-Match Lithography Based Ultrathin-body SOI Nanowires and Schottky-S/D-FETs
Language: English
Journal or Publication Title: Proceedings of Semiconductor Advances for Future Electronics (SAFE)
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Event Title: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
Event Location: Veldhoven, Niederlande
Event Dates: 29.-30.09.2007
Date Deposited: 20 Nov 2008 08:28
Official URL: http://www.stw.nl/NR/rdonlyres/ADD2FB2C-3AD4-4D1E-BA0A-1EAEA...
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