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Sabet, S. ; Moradabadi, A. ; Gorji, S. ; Fawey, M. H. ; Hildebrandt, E. ; Radulov, I. ; Wang, D. ; Zhang, H. ; Kübel, C. ; Alff, L. (2019):
Correlation of Interface Structure with Magnetic Exchange in a Hard/Soft Magnetic Model Nanostructure.
11, In: Physical Review Applied, (5), pp. 054078. American Physical Society (APS), ISSN 2331-7019,
DOI: 10.1103/PhysRevApplied.11.054078,
[Article]
Sabet, S. ; Moradabadi, Ashkan ; Gorji, S. ; Yi, Min ; Gong, Qihua ; Fawey, Mohammed ; Hildebrandt, E. ; Wang, D. ; Zhang, Hongbin ; Xu, Bai-Xiang ; Kübel, Christian ; Alff, Lambert (2018):
Impact of interface structure on magnetic exchange coupling in MnBi/Fe_x Co_{1−x} bilayers.
In: Physical Review B, 98, p. 174440. American Physical Society, ISSN 1098-0121,
DOI: 10.1103/PhysRevB.98.174440,
[Article]
Sabet, S. ; Moradabadi, A. ; Gorji, S. ; Yi, M. ; Gong, Q. ; Fawey, M. H. ; Hildebrandt, E. ; Wang, D. ; Zhang, H. ; Xu, B.-X. ; Kübel, C. ; Alff, L. (2018):
Impact of interface structure on magnetic exchange coupling in MnBi/FexCo1−x bilayers.
In: Physical Review B, 98 (17), American Physical Society, ISSN 2469-9950,
DOI: 10.1103/PhysRevB.98.174440,
[Article]
Sharma, S. ; Hildebrandt, E. ; Major, M. ; Komissinskiy, P. ; Radulov, I. ; Alff, L. (2018):
CeCo 5 thin films with perpendicular anisotropy grown by molecular beam epitaxy.
In: Journal of Magnetism and Magnetic Materials, 452, pp. 80-85. ISSN 03048853,
DOI: 10.1016/j.jmmm.2017.12.042,
[Article]
Zintler, A. ; Kunz, U. ; Pivak, Y. ; Sharath, S. U. ; Vogel, S. ; Hildebrandt, E. ; Kleebe, H.-J. ; Alff, L. ; Molina-Luna, L. (2017):
FIB based fabrication of an operative Pt/HfO 2 /TiN device for resistive switching inside a transmission electron microscope.
In: Ultramicroscopy, 181, pp. 144-149. Elsevier Science Publishing, ISSN 03043991,
DOI: 10.1016/j.ultramic.2017.04.008,
[Article]
Sharma, S. ; Hildebrandt, E. ; Sharath, S. U. ; Radulov, I. ; Alff, L. (2017):
YCo 5 ± x thin films with perpendicular anisotropy grown by molecular beam epitaxy.
In: Journal of Magnetism and Magnetic Materials, 432, pp. 382-386. Elsevier Science Publishing, ISSN 03048853,
[Article]
Sharma, S. ; Hildebrandt, E. ; Sharath, S. U. ; Radulov, I. ; Alff, L. (2017):
YCo5±xthin films with perpendicular anisotropy grown by molecular beam epitaxy.
In: Journal of Magnetism and Magnetic Materials, 432, pp. 382-386. Elsevier Science Publishing, ISSN 03048853,
DOI: 10.1016/j.jmmm.2017.02.020,
[Article]
Niu, G. ; Schubert, M. A. ; Sharath, S. U. ; Zaumseil, P. ; Vogel, S. ; Wenger, C. ; Hildebrandt, E. ; Bhupathi, S. ; Perez, E. ; Alff, L. ; Lehmann, M. ; Schroeder, T. ; Niermann, T. (2017):
Electron holography on HfO2/HfO2−x bilayer structures with multilevel resistive switching properties.
In: Nanotechnology, 28 (21), p. 215702. IOP Science Publishing, ISSN 0957-4484,
[Article]
Niu, G. ; Schubert, M. A. ; Sharath, S. U. ; Zaumseil, P. ; Vogel, S. ; Wenger, C. ; Hildebrandt, E. ; Bhupathi, S. ; Perez, E. ; Alff, L. ; Lehmann, M. ; Schroeder, T. ; Niermann, T. (2017):
Electron holography on HfO2/HfO2−xbilayer structures with multilevel resistive switching properties.
In: Nanotechnology, 28 (21), p. 215702. IOP Publishing, ISSN 0957-4484,
DOI: 10.1088/1361-6528/aa6cd9,
[Article]
Sabet, S. ; Hildebrandt, E. ; Romer, F. M. ; Radulov, I. ; Zhang, H. ; Farle, M. ; Alff, L. (2017):
Low-Temperature Phase <italic>c</italic>-axis Oriented Manganese Bismuth Thin Films With High Anisotropy Grown From an Alloy Mn55Bi45 Target.
In: IEEE Transactions on Magnetics, 53 (4), pp. 1-6. IEEE Publishing, ISSN 0018-9464,
[Article]
Sabet, S. ; Hildebrandt, E. ; Romer, F. M. ; Radulov, I. ; Zhang, H. ; Farle, M. ; Alff, L. (2017):
Low-Temperature Phase c-axis Oriented Manganese Bismuth Thin Films With High Anisotropy Grown From an Alloy Mn55Bi45Target.
In: IEEE Transactions on Magnetics, 53 (4), pp. 1-6. IEEE, ISSN 0018-9464,
DOI: 10.1109/TMAG.2016.2636817,
[Article]
Gölden, D. ; Hildebrandt, E. ; Alff, L. (2017):
Thin film phase diagram of iron nitrides grown by molecular beam epitaxy.
In: Journal of Magnetism and Magnetic Materials, 422, pp. 407-411. Elsevier Science Publishing, ISSN 03048853,
DOI: 10.1016/j.jmmm.2016.07.074,
[Article]
Sabet, S. ; Hildebrandt, E. ; Alff, L. (2017):
Synthesis and magnetic properties of the thin film exchange spring system of MnBi/FeCo.
In: Journal of Physics: Conference Series, 903, pp. 012032. IOP Publishing Ltd, ISSN 1742-6588,
DOI: 10.1088/1742-6596/903/1/012032,
[Article]
Rodenbücher, C. ; Hildebrandt, E. ; Szot, K. ; Sharath, S. U. ; Kurian, J. ; Komissinskiy, P. ; Breuer, U. ; Waser, R. ; Alff, L. (2016):
Hafnium carbide formation in oxygen deficient hafnium oxide thin films.
In: Applied Physics Letters, 108 (25), p. 252903. AIP Publishing, ISSN 0003-6951,
[Article]
Sharath, S. U. ; Joseph, M. J. ; Vogel, S. ; Hildebrandt, E. ; Komissinskiy, P. ; Kurian, J. ; Schroeder, T. ; Alff, L. (2016):
Impact of oxygen stoichiometry on electroforming and multiple switching modes in TiN/TaOx/Pt based ReRAM.
In: Applied Physics Letters, 109 (17), p. 173503. AIP Publishing, ISSN 0003-6951,
[Article]
Sharath, S. U. ; Bertaud, T. ; Kurian, J. ; Hildebrandt, E. ; Walczyk, C. ; Calka, P. ; Zaumseil, P. ; Sowinska, M. ; Walczyk, D. ; Gloskovskii, A. ; Schroeder, T. ; Alff, L. (2014):
Towards forming-free resistive switching in oxygen engineered HfO2−x.
In: Applied Physics Letters, 104 (6), pp. 063502. AIP Publishing LLC, ISSN 0003-6951,
[Article]
Sharath, S. U. ; Kurian, J. ; Komissinskiy, P. ; Hildebrandt, E. ; Bertaud, T. ; Walczyk, C. ; Calka, P. ; Schroeder, T. ; Alff, L. (2014):
Thickness independent reduced forming voltage in oxygen engineered HfO2 based resistive switching memories.
In: Applied Physics Letters, 105 (7), pp. 073505. AIP Publishing LLC, ISSN 0003-6951,
[Article]
Kayhan, Mehmet ; Hildebrandt, E. ; Alff, Lambert ; Albert, Barbara (2012):
Probing for Superconductivity in the Mo-B System.
In: Zeitschrift für anorganische Chemie, 638 (10), p. 1614. Wiley, ISSN 00442313,
DOI: 10.1002/zaac.201204095,
[Article]
Hildebrandt, E. ; Kurian, J. ; Zimmermann, J. ; Fleissner, A. ; Seggern, H. von ; Alff, L. (2009):
Hafnium oxide thin films: Effect of growth parameters on oxygen and hafnium vacancies.
In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 27 (1), pp. 325-328. ISSN 10711023,
[Article]