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Hildebrandt, E. and Kurian, J. and Zimmermann, J. and Fleissner, A. and von Seggern, H. and Alff, L. (2009):
Hafnium oxide thin films: Effect of growth parameters on oxygen and hafnium vacancies.
In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, pp. 325-328, 27, (1), ISSN 10711023,
[Online-Edition: http://dx.doi.org/10.1116/1.3043474],
[Article]

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