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Number of items: 2.

Sharath, S. U. and Bertaud, T. and Kurian, J. and Hildebrandt, E. and Walczyk, C. and Calka, P. and Zaumseil, P. and Sowinska, M. and Walczyk, D. and Gloskovskii, A. and Schroeder, T. and Alff, L. (2014):
Towards forming-free resistive switching in oxygen engineered HfO2−x.
In: Applied Physics Letters, AIP Publishing LLC, pp. 063502, 104, (6), ISSN 0003-6951,
[Online-Edition: http://dx.doi.org/10.1063/1.4864653],
[Article]

Sharath, S. U. and Kurian, J. and Komissinskiy, P. and Hildebrandt, E. and Bertaud, T. and Walczyk, C. and Calka, P. and Schroeder, T. and Alff, L. (2014):
Thickness independent reduced forming voltage in oxygen engineered HfO2 based resistive switching memories.
In: Applied Physics Letters, AIP Publishing LLC, pp. 073505, 105, (7), ISSN 0003-6951,
[Online-Edition: http://dx.doi.org/10.1063/1.4893605],
[Article]

This list was generated on Tue Jul 16 02:13:31 2019 CEST.