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Sharath, S. U. and Bertaud, T. and Kurian, J. and Hildebrandt, E. and Walczyk, C. and Calka, P. and Zaumseil, P. and Sowinska, M. and Walczyk, D. and Gloskovskii, A. and Schroeder, T. and Alff, L. (2014):
Towards forming-free resistive switching in oxygen engineered HfO2−x.
In: Applied Physics Letters, AIP Publishing LLC, pp. 063502, 104, (6), ISSN 0003-6951,
[Online-Edition: http://dx.doi.org/10.1063/1.4864653],
[Article]

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