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Sharma, S. ; Hildebrandt, E. ; Sharath, S.U. ; Radulov, I. ; Alff, L. :
YCo 5 ± x thin films with perpendicular anisotropy grown by molecular beam epitaxy.
[Online-Edition: http://doi.org/10.1016/j.jmmm.2017.02.020]
In: Journal of Magnetism and Magnetic Materials, 432 pp. 382-386. ISSN 03048853
[Artikel], (2017)

Sabet, S. ; Hildebrandt, E. ; Romer, F. M. ; Radulov, I. ; Zhang, H. ; Farle, M. ; Alff, L. :
Low-Temperature Phase <italic>c</italic>-axis Oriented Manganese Bismuth Thin Films With High Anisotropy Grown From an Alloy Mn55Bi45 Target.
[Online-Edition: http://doi.org/10.1109/TMAG.2016.2636817]
In: IEEE Transactions on Magnetics, 53 (4) pp. 1-6. ISSN 0018-9464
[Artikel], (2017)

Gölden, D. ; Hildebrandt, E. ; Alff, L. :
Thin film phase diagram of iron nitrides grown by molecular beam epitaxy.
[Online-Edition: http://doi.org/10.1016/j.jmmm.2016.07.074]
In: Journal of Magnetism and Magnetic Materials, 422 pp. 407-411. ISSN 03048853
[Artikel], (2017)

Rodenbücher, C. ; Hildebrandt, E. ; Szot, K. ; Sharath, S. U. ; Kurian, J. ; Komissinskiy, P. ; Breuer, U. ; Waser, R. ; Alff, L. :
Hafnium carbide formation in oxygen deficient hafnium oxide thin films.
[Online-Edition: http://doi.org/10.1063/1.4954714]
In: Applied Physics Letters, 108 (25) p. 252903. ISSN 0003-6951
[Artikel], (2016)

Sharath, S. U. ; Joseph, M. J. ; Vogel, S. ; Hildebrandt, E. ; Komissinskiy, P. ; Kurian, J. ; Schroeder, T. ; Alff, L. :
Impact of oxygen stoichiometry on electroforming and multiple switching modes in TiN/TaOx/Pt based ReRAM.
[Online-Edition: http://doi.org/10.1063/1.4965872]
In: Applied Physics Letters, 109 (17) p. 173503. ISSN 0003-6951
[Artikel], (2016)

Sharath, S. U. ; Bertaud, T. ; Kurian, J. ; Hildebrandt, E. ; Walczyk, C. ; Calka, P. ; Zaumseil, P. ; Sowinska, M. ; Walczyk, D. ; Gloskovskii, A. ; Schroeder, T. ; Alff, L. :
Towards forming-free resistive switching in oxygen engineered HfO2−x.
[Online-Edition: http://dx.doi.org/10.1063/1.4864653]
In: Applied Physics Letters, 104 (6) 063502. ISSN 0003-6951
[Artikel], (2014)

Sharath, S. U. ; Kurian, J. ; Komissinskiy, P. ; Hildebrandt, E. ; Bertaud, T. ; Walczyk, C. ; Calka, P. ; Schroeder, T. ; Alff, L. :
Thickness independent reduced forming voltage in oxygen engineered HfO2 based resistive switching memories.
[Online-Edition: http://dx.doi.org/10.1063/1.4893605]
In: Applied Physics Letters, 105 (7) 073505. ISSN 0003-6951
[Artikel], (2014)

Hildebrandt, E. ; Kurian, J. ; Zimmermann, J. ; Fleissner, A. ; von Seggern, H. ; Alff, L. :
Hafnium oxide thin films: Effect of growth parameters on oxygen and hafnium vacancies.
[Online-Edition: http://dx.doi.org/10.1116/1.3043474]
In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 27 (1) pp. 325-328. ISSN 10711023
[Artikel], (2009)

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