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Number of items: 20.

Ensinger, W. and Lensch, O. and Sittner, F. and Knecht, J. and Volz, K. and Matsutani, T. and Kiuchi, M. :
Argon versus nitrogen ion beam assisted deposition of amorphous carbon and carbon–nitrogen films on aluminum for protection against aqueous corrosion.
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(03)00757-2]
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 206 pp. 334-338. ISSN 0168583X
[Article] , (2003)

Ensinger, W. and Lensch, O. and Knecht, J. and Volz, K. and Matsutani, T. and Kiuchi, M. :
Pitting corrosion of aluminum coated by ion beam assisted deposition of carbon with argon ions at different ion-to-atom arrival ratios.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00315-8]
In: Surface and Coatings Technology, 158-15 (158-159) pp. 594-598. ISSN 02578972
[Article] , (2002)

Volz, K. and Ensinger, W. :
Growth of the carbide, nitride and oxide of silicon by plasma immersion ion implantation.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00098-1]
In: Surface and Coatings Technology, 156 (1-3) pp. 237-243. ISSN 02578972
[Article] , (2002)

Ensinger, W. and Volz, K. and Galonska, M. and Gabor, Ch. and Klein, H. :
The multi-aperture hollow target: a method for determining ion incidence angles in plasma immersion ion implantation.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00129-9]
In: Surface & coatings technology, 156 (1-3) pp. 92-96. ISSN 0257-8972
[Article] , (2002)

Galonska, M. and Gabor, Ch. and Thomae, R. W. and Klein, H. and Volz, K. and Ensinger, W. :
Determination of ion incidence angles in plasma immersion ion implantation by means of a hollow multi-aperture target.
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(00)00653-4]
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms (175-177) pp. 658-662. ISSN 0168-583X
[Article] , (2001)

Volz, K. and Klatt, Ch. and Ensinger, W. :
Heteroepitaxial SiC films grown in Si by CH4 plasma immersion ion implantation: Conditions and mechanisms of their formation.
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(00)00629-7]
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms (175-177) pp. 569-574. ISSN 0168-583X
[Article] , (2001)

Lensch, O. and Volz, K. and Kiuchi, M. and Ensinger, W. :
Pitting corrosion of aluminium coated with amorphous carbon films by argon ion beam assisted deposition at low process temperature.
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(00)00649-2]
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms (175-177) pp. 575-579. ISSN 0168-583X
[Article] , (2001)

Ensinger, W. and Volz, K. and Enders, B. :
Inner wall coating of cylinders by plasma immersion ion implantation for corrosion protection.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)01056-2]
In: Surface & coatings technology, 136 (1-3) pp. 202-206. ISSN 0257-8972
[Article] , (2001)

Volz, K. and Baba, K. and Hatada, R. and Ensinger, W. :
Silicon carbide and amorphous carbon film formation by plasma immersion ion implantation: a comparison of methane and toluene as plasma forming gases.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)01055-0]
In: Surface & coatings technology, 136 (1-3) pp. 197-201. ISSN 0257-8972
[Article] , (2001)

Volz, K. and Hasse, A. and Ensinger, W. :
Studies on treatment homogeneity of plasma immersion ion implantation by an optical method.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)01016-1]
In: Surface and Coatings Technology, 136 (1-3) pp. 80-84. ISSN 02578972
[Article] , (2001)

Volz, K. and Schreiber, S. and Gerlach, J. W. and Reiber, W. and Rauschenbach, B. and Stritzker, B. and Assmann, W. and Ensinger, W. :
Heteroepitaxial growth of 3C-SiC on (100) silicon by C60 and Si molecular beam epitaxy.
[Online-Edition: http://dx.doi.org/10.1016/S0921-5093(00)00825-X]
In: Materials Science and Engineering: A, 289 (1-2) pp. 255-264. ISSN 09215093
[Article] , (2000)

Volz, K. and Kiuchi, M. and Okumura, M. and Ensinger, W. :
C–SiC–Si gradient films formed on silicon by ion beam assisted deposition at room temperature.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00604-6]
In: Surface and Coatings Technology (128-129) pp. 274-279. ISSN 02578972
[Article] , (2000)

Ensinger, W. and Volz, K. and Kiuchi, M. :
Ion beam-assisted deposition of nitrides of the 4th group of transition metals.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00662-9]
In: Surface and Coatings Technology (128-129) pp. 81-84. ISSN 02578972
[Article] , (2000)

Ensinger, Wolfgang and Volz, K. :
Ion-beam assisted coating of tube inner walls by plasma immersion ion implantation.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00603-4]
In: Surface and Coatings Technology (128-129) pp. 270-273. ISSN 02578972
[Article] , (2000)

Volz, K. and Enders, B. and Ensinger, W. :
Nitrogen plasma immersion ion implantation and silicon sputter deposition combined with methane implantation as an in-line process for improving corrosion and wear performance of stainless steels.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00624-1]
In: Surface and Coatings Technology (128-129) pp. 479-483. ISSN 02578972
[Article] , (2000)

Ensinger, Wolfgang and Volz, K. and Höchbauer, T. :
Plasma immersion ion implantation of complex-shaped objects: an experimental study on the treatment homogeneity.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00601-0]
In: Surface and Coatings Technology (128-129) pp. 265-269. ISSN 02578972
[Article] , (2000)

Volz, K. and Kiuchi, M. and Ensinger, W. :
Tantalum nitride films formed by ion beam assisted deposition: analysis of the structure in dependence on the ion irradiation intensity.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00583-1]
In: Surface and Coatings Technology (128-129) pp. 298-302. ISSN 02578972
[Article] , (2000)

Volz, K. and Rauschenbach, B. and Klatt, C. and Ensinger, W. :
Ammonia plasma immersion ion implantation into silicon: Composition and structure of the resulting silicon–nitrogen–hydrogen system.
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(99)00866-6]
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms (166-167) pp. 75-81. ISSN 0168583X
[Article] , (2000)

Ensinger, W. and Volz, K. :
Thin film oxides as probe for homogeneity measurements of 3-dimensional objects treated by plasma immersion ion implantation.
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(99)00739-9]
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms (166-167) pp. 154-158. ISSN 0168583X
[Article] , (2000)

Volz, K. and Klatt, Ch. and Ensinger, Wolfgang :
Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma.
In: Mat. Res. Soc. Symp. Proc. 609 p. 271.
[Article] , (2000)

This list was generated on Tue May 21 01:59:31 2019 CEST.