TU Darmstadt / ULB / TUbiblio

C–SiC–Si gradient films formed on silicon by ion beam assisted deposition at room temperature

Volz, K. and Kiuchi, M. and Okumura, M. and Ensinger, W. :
C–SiC–Si gradient films formed on silicon by ion beam assisted deposition at room temperature.
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00604-6]
In: Surface and Coatings Technology (128-129) pp. 274-279. ISSN 02578972
[Article] , (2000)

Official URL: http://dx.doi.org/10.1016/S0257-8972(00)00604-6

Abstract

Ion beam assisted deposition (IBAD) of carbon under medium energy (35 keV) Ar ion bombardment onto a silicon target results in the formation of silicon carbide. The formation of a-C–SiC–Si gradient films is dependent on the ion/atom arrival ratio (I/A). All films are deposited at room temperature. The gradient layers formed are examined for their composition using RBS. Depending on the I/A ratios, mixed interfaces of different widths, where silicon carbide exists, are formed. The SiC bonding in the mixed region is proven by XPS. The film formed on top of some samples contains amorphous carbon regions as shown by Raman spectroscopy. The surface of the layers grown is rather smooth with a roughness of several nanometres.

Item Type: Article
Erschienen: 2000
Creators: Volz, K. and Kiuchi, M. and Okumura, M. and Ensinger, W.
Title: C–SiC–Si gradient films formed on silicon by ion beam assisted deposition at room temperature
Language: English
Abstract:

Ion beam assisted deposition (IBAD) of carbon under medium energy (35 keV) Ar ion bombardment onto a silicon target results in the formation of silicon carbide. The formation of a-C–SiC–Si gradient films is dependent on the ion/atom arrival ratio (I/A). All films are deposited at room temperature. The gradient layers formed are examined for their composition using RBS. Depending on the I/A ratios, mixed interfaces of different widths, where silicon carbide exists, are formed. The SiC bonding in the mixed region is proven by XPS. The film formed on top of some samples contains amorphous carbon regions as shown by Raman spectroscopy. The surface of the layers grown is rather smooth with a roughness of several nanometres.

Journal or Publication Title: Surface and Coatings Technology
Number: 128-129
Publisher: Elsevier
Uncontrolled Keywords: Ion beam assisted deposition, Silicon carbide, Amorphous carbon, Gradient films
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
Date Deposited: 25 Jun 2012 11:15
Official URL: http://dx.doi.org/10.1016/S0257-8972(00)00604-6
Identification Number: doi:10.1016/S0257-8972(00)00604-6
Export:

Optionen (nur für Redakteure)

View Item View Item