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Comparison of thermally and mechanically induced Si layer transfer in hydrogen-implanted Si wafers.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 216, pp. 257-263. Elsevier, ISSN 0168583X,
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Ensinger, Wolfgang and Volz, K. and Höchbauer, T. (2000):
Plasma immersion ion implantation of complex-shaped objects: an experimental study on the treatment homogeneity.
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