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Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma

Volz, K. and Klatt, Ch. and Ensinger, Wolfgang (2000):
Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma.
In: Mat. Res. Soc. Symp. Proc. 609, p. 271. [Article]

Item Type: Article
Erschienen: 2000
Creators: Volz, K. and Klatt, Ch. and Ensinger, Wolfgang
Title: Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma
Language: English
Journal or Publication Title: Mat. Res. Soc. Symp. Proc. 609
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 25 Jun 2012 09:37
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