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Number of items: 20.

English

Ensinger, W. and Lensch, O. and Sittner, F. and Knecht, J. and Volz, K. and Matsutani, T. and Kiuchi, M. (2003):
Argon versus nitrogen ion beam assisted deposition of amorphous carbon and carbon–nitrogen films on aluminum for protection against aqueous corrosion.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, pp. 334-338, 206, ISSN 0168583X,
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(03)00757-2],
[Article]

Ensinger, W. and Lensch, O. and Knecht, J. and Volz, K. and Matsutani, T. and Kiuchi, M. (2002):
Pitting corrosion of aluminum coated by ion beam assisted deposition of carbon with argon ions at different ion-to-atom arrival ratios.
In: Surface and Coatings Technology, Elsevier, pp. 594-598, 158-15, (158-159), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00315-8],
[Article]

Volz, K. and Ensinger, W. (2002):
Growth of the carbide, nitride and oxide of silicon by plasma immersion ion implantation.
In: Surface and Coatings Technology, Elsevier, pp. 237-243, 156, (1-3), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00098-1],
[Article]

Ensinger, W. and Volz, K. and Galonska, M. and Gabor, Ch. and Klein, H. (2002):
The multi-aperture hollow target: a method for determining ion incidence angles in plasma immersion ion implantation.
In: Surface & coatings technology, pp. 92-96, 156, (1-3), ISSN 0257-8972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(02)00129-9],
[Article]

Galonska, M. and Gabor, Ch. and Thomae, R. W. and Klein, H. and Volz, K. and Ensinger, W. (2001):
Determination of ion incidence angles in plasma immersion ion implantation by means of a hollow multi-aperture target.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, pp. 658-662, (175-177), ISSN 0168-583X,
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(00)00653-4],
[Article]

Volz, K. and Klatt, Ch. and Ensinger, W. (2001):
Heteroepitaxial SiC films grown in Si by CH4 plasma immersion ion implantation: Conditions and mechanisms of their formation.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, pp. 569-574, (175-177), ISSN 0168-583X,
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(00)00629-7],
[Article]

Lensch, O. and Volz, K. and Kiuchi, M. and Ensinger, W. (2001):
Pitting corrosion of aluminium coated with amorphous carbon films by argon ion beam assisted deposition at low process temperature.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, pp. 575-579, (175-177), ISSN 0168-583X,
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(00)00649-2],
[Article]

Ensinger, W. and Volz, K. and Enders, B. (2001):
Inner wall coating of cylinders by plasma immersion ion implantation for corrosion protection.
In: Surface & coatings technology, pp. 202-206, 136, (1-3), ISSN 0257-8972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)01056-2],
[Article]

Volz, K. and Baba, K. and Hatada, R. and Ensinger, W. (2001):
Silicon carbide and amorphous carbon film formation by plasma immersion ion implantation: a comparison of methane and toluene as plasma forming gases.
In: Surface & coatings technology, pp. 197-201, 136, (1-3), ISSN 0257-8972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)01055-0],
[Article]

Volz, K. and Hasse, A. and Ensinger, W. (2001):
Studies on treatment homogeneity of plasma immersion ion implantation by an optical method.
In: Surface and Coatings Technology, Elsevier, pp. 80-84, 136, (1-3), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)01016-1],
[Article]

Volz, K. and Schreiber, S. and Gerlach, J. W. and Reiber, W. and Rauschenbach, B. and Stritzker, B. and Assmann, W. and Ensinger, W. (2000):
Heteroepitaxial growth of 3C-SiC on (100) silicon by C60 and Si molecular beam epitaxy.
In: Materials Science and Engineering: A, Elsevier, pp. 255-264, 289, (1-2), ISSN 09215093,
[Online-Edition: http://dx.doi.org/10.1016/S0921-5093(00)00825-X],
[Article]

Volz, K. and Kiuchi, M. and Okumura, M. and Ensinger, W. (2000):
C–SiC–Si gradient films formed on silicon by ion beam assisted deposition at room temperature.
In: Surface and Coatings Technology, Elsevier, pp. 274-279, (128-129), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00604-6],
[Article]

Ensinger, W. and Volz, K. and Kiuchi, M. (2000):
Ion beam-assisted deposition of nitrides of the 4th group of transition metals.
In: Surface and Coatings Technology, Elsevier, pp. 81-84, (128-129), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00662-9],
[Article]

Ensinger, Wolfgang and Volz, K. (2000):
Ion-beam assisted coating of tube inner walls by plasma immersion ion implantation.
In: Surface and Coatings Technology, Elsevier, pp. 270-273, (128-129), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00603-4],
[Article]

Volz, K. and Enders, B. and Ensinger, W. (2000):
Nitrogen plasma immersion ion implantation and silicon sputter deposition combined with methane implantation as an in-line process for improving corrosion and wear performance of stainless steels.
In: Surface and Coatings Technology, Elsevier, pp. 479-483, (128-129), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00624-1],
[Article]

Ensinger, Wolfgang and Volz, K. and Höchbauer, T. (2000):
Plasma immersion ion implantation of complex-shaped objects: an experimental study on the treatment homogeneity.
In: Surface and Coatings Technology, Elsevier, pp. 265-269, (128-129), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00601-0],
[Article]

Volz, K. and Kiuchi, M. and Ensinger, W. (2000):
Tantalum nitride films formed by ion beam assisted deposition: analysis of the structure in dependence on the ion irradiation intensity.
In: Surface and Coatings Technology, Elsevier, pp. 298-302, (128-129), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00583-1],
[Article]

Volz, K. and Rauschenbach, B. and Klatt, C. and Ensinger, W. (2000):
Ammonia plasma immersion ion implantation into silicon: Composition and structure of the resulting silicon–nitrogen–hydrogen system.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, pp. 75-81, (166-167), ISSN 0168583X,
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(99)00866-6],
[Article]

Ensinger, W. and Volz, K. (2000):
Thin film oxides as probe for homogeneity measurements of 3-dimensional objects treated by plasma immersion ion implantation.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, pp. 154-158, (166-167), ISSN 0168583X,
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(99)00739-9],
[Article]

Volz, K. and Klatt, Ch. and Ensinger, Wolfgang (2000):
Composition and structure of SiCx:H Films Formed by Plasma Immersion Ion Implantation from a Methane Plasma.
In: Mat. Res. Soc. Symp. Proc. 609, p. 271, [Article]

This list was generated on Sat Jun 15 00:36:28 2019 CEST.