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Number of items: 12.

Das, A. K. and Hatada, R. and Ensinger, W. and Flege, S. and Baba, K. and Meikap, A. K. (2018):
Dielectric constant, AC conductivity and impedance spectroscopy of zinc-containing diamond-like carbon film UV photodetector.
In: Journal of Alloys and Compounds, Elsevier Science Publishing, pp. 194-205, 758, ISSN 09258388,
DOI: 10.1016/j.jallcom.2018.05.121,
[Online-Edition: https://doi.org/10.1016/j.jallcom.2018.05.121],
[Article]

Inoi, T. and Baba, K. and Flege, S. and Hatada, R. and Ensinger, W. (2018):
Preparation of iodine containing diamond-like carbon films by trifluoroiodomethane.
In: Materials Letters, Elsevier Science Publishing, pp. 68-70, 215, ISSN 0167577X,
DOI: 10.1016/j.matlet.2017.12.061,
[Online-Edition: https://doi.org/10.1016/j.matlet.2017.12.061],
[Article]

Hatada, R. and Flege, S. and Ensinger, W. and Baba, K. (2018):
Preparation of anatase films from titanium containing diamond-like carbon films.
In: Materials Letters, Elsevier Science Publishing, pp. 148-150, 213, ISSN 0167577X,
DOI: 10.1016/j.matlet.2017.11.034,
[Online-Edition: https://doi.org/10.1016/j.matlet.2017.11.034],
[Article]

Inoi, T. and Baba, K. and Flege, S. and Hatada, R. and Ensinger, W. (2018):
Properties of iodine containing diamond-like carbon films prepared by plasma source ion implantation.
In: Diamond and Related Materials, Elsevier Science Publishing, pp. 108-112, 81, ISSN 09259635,
DOI: 10.1016/j.diamond.2017.11.013,
[Online-Edition: https://doi.org/10.1016/j.diamond.2017.11.013],
[Article]

Flege, S. and Hatada, R. and Derepa, A. and Dietz, C. and Ensinger, W. and Baba, K. (2017):
Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition.
In: Review of Scientific Instruments, AIP Publications, pp. 096106, 88, (9), ISSN 0034-6748,
DOI: 10.1063/1.4995080,
[Online-Edition: https://doi.org/10.1063/1.4995080],
[Article]

Flege, S. and Hatada, R. and Vogel, T. and Bruder, E. and Major, M. and Ensinger, W. and Baba, K. (2017):
Tightly adhering diamond-like carbon films on copper substrates by oxygen pre-implantation.
In: Surface and Coatings Technology, Elsevier Science Publishing, ISSN 02578972,
DOI: 10.1016/j.surfcoat.2017.12.029,
[Online-Edition: https://doi.org/10.1016/j.surfcoat.2017.12.029],
[Article]

Flege, S. and Hatada, R. and Kaiser, T. and Muench, F. and Cherkashinin, G. and Schwöbel, A. and Ensinger, W. and Baba, K. (2016):
Use of a nanostructured surface coating to achieve higher sputter rates.
In: Materials Letters, pp. 532-534, 164, ISSN 0167-577X,
[Online-Edition: http://dx.doi.org/10.1016/j.matlet.2015.11.059],
[Article]

Hatada, R. and Flege, S. and Bobrich, A. and Ensinger, W. and Dietz, C. and Baba, K. and Sawase, T. and Watamoto, T. and Matsutani, T. (2014):
Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering.
In: Applied Surface Science, ELSEVIER SCIENCE BV, AMSTERDAM, NETHERLANDS, pp. 257-261, 310, ISSN 01694332,
[Online-Edition: http://dx.doi.org/10.1016/j.apsusc.2014.03.071],
[Article]

Baba, K. and Hatada, R. and Flege, S. and Ensinger, W. (2012):
Preparation and Properties of Ag-Containing Diamond-Like Carbon Films by Magnetron Plasma Source Ion Implantation.
In: Advances in Materials Science and Engineering, Hindawi Publishing Corporation, pp. 1-5, 2012, ISSN 1687-8434,
[Online-Edition: http://dx.doi.org/10.1155/2012/536853],
[Article]

Hatada, R. and Flege, S. and Baba, K. and Ensinger, W. and Kleebe, H.-J. and Sethmann, I. and Lauterbach, S. (2010):
Temperature dependent properties of silicon containing diamondlike carbon films prepared by plasma source ion implantation.
In: Journal of Applied Physics, AIP, pp. 083307, 107, (8), ISSN 00218979,
[Online-Edition: http://dx.doi.org/10.1063/1.3394002],
[Article]

Flege, S. and Kraft, G. and Bruder, E. and Baba, K. and Hatada, R. and Ensinger, W. (2009):
Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation.
In: Journal of Applied Physics 106, American Institute of Physics, pp. 023302, 106, (2), [Article]

Volz, K. and Baba, K. and Hatada, R. and Ensinger, W. (2001):
Silicon carbide and amorphous carbon film formation by plasma immersion ion implantation: a comparison of methane and toluene as plasma forming gases.
In: Surface & coatings technology, pp. 197-201, 136, (1-3), ISSN 0257-8972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)01055-0],
[Article]

This list was generated on Sat Oct 19 01:45:38 2019 CEST.