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Volz, K. and Rauschenbach, B. and Klatt, C. and Ensinger, W. :
Ammonia plasma immersion ion implantation into silicon: Composition and structure of the resulting silicon–nitrogen–hydrogen system.
[Online-Edition: http://dx.doi.org/10.1016/S0168-583X(99)00866-6]
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms (166-167) pp. 75-81. ISSN 0168583X
[Article] , (2000)

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