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Ion beam-assisted deposition of nitrides of the 4th group of transition metals

Ensinger, W. and Volz, K. and Kiuchi, M. (2000):
Ion beam-assisted deposition of nitrides of the 4th group of transition metals.
In: Surface and Coatings Technology, Elsevier, pp. 81-84, (128-129), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/S0257-8972(00)00662-9],
[Article]

Abstract

The nitrides of the reactive transition metals of the 4th group (Ti, Zr, Hf) exhibit a number of technologically interesting properties such as high melting points, high hardness, chemical inertness, and decorative appearence. They can be formed by ion beam-assisted deposition at substrates held at room temperature. The nitrides were deposited on silicon by electron beam evaporation of the respective metal under nitrogen ion bombardment with medium to high ion energies (10–30 keV). X-Ray photo electron spectrometry showed that the metals tend to incoporate large amounts of oxygen. This can be reduced by intense ion irradiation. By X-ray diffraction measurements phase formation was determined as a function of the ion-to-atom arrival ratio. The grains show a preferential (100) crystal orientation. The formation of this texture depends on the ion-to-atom arrival ratio and on the metal atomic mass. The films grow in columns which are composed of small crystallites.

Item Type: Article
Erschienen: 2000
Creators: Ensinger, W. and Volz, K. and Kiuchi, M.
Title: Ion beam-assisted deposition of nitrides of the 4th group of transition metals
Language: English
Abstract:

The nitrides of the reactive transition metals of the 4th group (Ti, Zr, Hf) exhibit a number of technologically interesting properties such as high melting points, high hardness, chemical inertness, and decorative appearence. They can be formed by ion beam-assisted deposition at substrates held at room temperature. The nitrides were deposited on silicon by electron beam evaporation of the respective metal under nitrogen ion bombardment with medium to high ion energies (10–30 keV). X-Ray photo electron spectrometry showed that the metals tend to incoporate large amounts of oxygen. This can be reduced by intense ion irradiation. By X-ray diffraction measurements phase formation was determined as a function of the ion-to-atom arrival ratio. The grains show a preferential (100) crystal orientation. The formation of this texture depends on the ion-to-atom arrival ratio and on the metal atomic mass. The films grow in columns which are composed of small crystallites.

Journal or Publication Title: Surface and Coatings Technology
Number: 128-129
Publisher: Elsevier
Uncontrolled Keywords: Ion beam-assisted deposition, Titanium nitride, Hafnium nitride, Zirconium nitride
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
Date Deposited: 25 Jun 2012 11:24
Official URL: http://dx.doi.org/10.1016/S0257-8972(00)00662-9
Identification Number: doi:10.1016/S0257-8972(00)00662-9
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