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Number of items: 12.

Ensling, D. and Cherkashinin, G. and Schmid, S. and Bhuvaneswari, S. and Thissen, A. and Jaegermann, W. (2014):
Nonrigid Band Behavior of the Electronic Structure of LiCoO2 Thin Film during Electrochemical Li Deintercalation.
26, In: Chemistry of Materials, (13), ACS Publications, pp. 3948-3956, ISSN 0897-4756, [Online-Edition: http://dx.doi.org/10.1021/cm501480b],
[Article]

Klein, Andreas and Mayer, T. and Thissen, A. and Jaegermann, W. (2008):
Photoelectron Spectroscopy in Materials Science and Physical Chemistry: Analysis of Composition, Chemical Bonding, and Electronic Structure of Surfaces and Interfaces.
10, In: Bunsen-Magazin, pp. 124-139, ISSN 0005-9021, [Online-Edition: http://dx.doi.org/10.1002/9783527636839.ch15],
[Article]

Wu, Q.-H. and Thissen, A. and Jaegermann, W. and Schüz, M. and Schmidt, P. C. (2006):
Resonant photoemission spectroscopy study of electronic structure of V2O5.
430, In: Chemical Physics Letters, (4-6), pp. 309-313, ISSN 00092614, [Online-Edition: http://dx.doi.org/10.1016/j.cplett.2006.08.071],
[Article]

Donsanti, F. and Kostourou, K. and Decker, F. and Ibris, N. and Salvi, A. M. and Liberatore, M. and Thissen, A. and Jaegermann, W. and Lincot, D. (2006):
Alkali ion intercalation in V2O5: Preparation and laboratory characterization of thin films produced by ALD.
38, In: Surface and Interface Analysis, (4), pp. 815-818, ISSN 0142-2421, [Online-Edition: http://dx.doi.org/10.1002/sia.2237],
[Article]

Zhou, Y. and Yan, X. and Kroke, E. and Riedel, R. and Probst, D. and Thissen, A. and Hauser, R. and Ahles, M. and von Seggern, H. (2006):
Deposition Temperature Effect on the Structure and Optical Property of RF-PACVD-Derived Hydrogenated SiCNO Film.
37, In: Materialwissenschaft und Werkstofftechnik, (2), Wiley-VCH Verlag GmbH, Weinheim, pp. 173-177, ISSN 0933-5137, DOI: 10.1002/mawe.200600993,
[Online-Edition: https://doi.org/10.1002/mawe.200600993],
[Article]

Zhou, Y. and Yan, X. and Kroke, E. and Riedel, R. and Probst, D. and Thissen, A. and Hauser, R. and Ahles, Marcus and von Seggern, Heinz (2006):
Deposition temperature effect on the structure and optical property of RF-PACVD-derived hydrogenated.
37, In: Materialwissenschaft und Werkstofftechnik, p. 173, [Article]

Zhou, Y. and Probst, D. and Thissen, A. and Kroke, E. and Riedel, R. and Hauser, R. and Hoche, H. and Bfroszeit, E. and Kroll, P. and Stafast, H. (2006):
Hard Silicon carbonitride films obtained by RF-plasma-enhanced chemical yapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
26, In: Journal of the European Ceramic Society, pp. 1325-1335, [Article]

Islam, A. B. M. O. and Thissen, A. and Klein, Andreas and Jaegermann, W. (2004):
Deposition of the layered semiconductor SnS2 onto H-terminated Si(111) surfaces: Failure of van der Waals epitaxy and possible implications.
572, In: Surface Science, (2-3), pp. 476-482, ISSN 00396028, [Online-Edition: http://dx.doi.org/10.1016/j.susc.2004.09.030],
[Article]

Liu, G. and Klein, Andreas and Thissen, A. and Jaegermann, W. (2003):
Electronic properties and interface characterization of phthalocyanine and Ru-polypyridine dyes on TiO2 surface.
539, In: Surface Science, (1-3), pp. 37-48, ISSN 00396028, [Online-Edition: http://dx.doi.org/10.1016/S0039-6028(03)00721-0],
[Article]

Kraft, D. and Weiler, U. and Tomm, Y. and Thissen, A. and Klein, Andreas and Jaegermann, W. (2003):
Alternative back contacts for CdTe solar cells: a photoemission study of the VSe2/CdTe and TiSe2/CdTe interface formation.
431-432, In: Thin Solid Films, pp. 382-386, ISSN 00406090, [Online-Edition: http://dx.doi.org/10.1016/S0040-6090(03)00254-2],
[Article]

Kraft, D. and Thissen, A. and Broetz, J. and Flege, S. and Campo, M. and Klein, Andreas and Jaegermann, W. (2003):
Characterization of tellurium layers for back contact formation on close to technology treated CdTe surfaces.
94, In: Journal of Applied Physics, (5), AIP, pp. 3589-3598, ISSN 00218979, [Online-Edition: http://dx.doi.org/10.1063/1.1597757],
[Article]

Fritsche, R. and Wisotzki, E. and Islam, A. B. M. O. and Thissen, A. and Klein, Andreas and Jaegermann, W. and Rudolph, R. and Tonti, D. and Pettenkofer, C. (2002):
Electronic passivation of Si(111) by Ga–Se half-sheet termination.
80, In: Applied Physics Letters, (8), pp. 1388-1390, ISSN 00036951, [Online-Edition: http://dx.doi.org/10.1063/1.1454228],
[Article]

This list was generated on Tue Feb 18 00:13:43 2020 CET.