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Number of items: 12.

Ensling, D. and Cherkashinin, G. and Schmid, S. and Bhuvaneswari, S. and Thissen, A. and Jaegermann, W. :
Nonrigid Band Behavior of the Electronic Structure of LiCoO2 Thin Film during Electrochemical Li Deintercalation.
[Online-Edition: http://dx.doi.org/10.1021/cm501480b]
In: Chemistry of Materials, 26 (13) pp. 3948-3956. ISSN 0897-4756
[Article] , (2014)

Klein, Andreas and Mayer, T. and Thissen, A. and Jaegermann, W. :
Photoelectron Spectroscopy in Materials Science and Physical Chemistry: Analysis of Composition, Chemical Bonding, and Electronic Structure of Surfaces and Interfaces.
[Online-Edition: http://dx.doi.org/10.1002/9783527636839.ch15]
In: Bunsen-Magazin, 10 pp. 124-139. ISSN 0005-9021
[Article] , (2008)

Wu, Q.-H. and Thissen, A. and Jaegermann, W. and Schüz, M. and Schmidt, P. C. :
Resonant photoemission spectroscopy study of electronic structure of V2O5.
[Online-Edition: http://dx.doi.org/10.1016/j.cplett.2006.08.071]
In: Chemical Physics Letters, 430 (4-6) pp. 309-313. ISSN 00092614
[Article] , (2006)
Note:

SFB 595 A3

Donsanti, F. and Kostourou, K. and Decker, F. and Ibris, N. and Salvi, A. M. and Liberatore, M. and Thissen, A. and Jaegermann, W. and Lincot, D. :
Alkali ion intercalation in V2O5: Preparation and laboratory characterization of thin films produced by ALD.
[Online-Edition: http://dx.doi.org/10.1002/sia.2237]
In: Surface and Interface Analysis, 38 (4) pp. 815-818. ISSN 0142-2421
[Article] , (2006)
Note:

SFB 595 A3

Zhou, Y. and Yan, X. and Kroke, E. and Riedel, R. and Probst, D. and Thissen, A. and Hauser, R. and Ahles, M. and von Seggern, H. :
Deposition Temperature Effect on the Structure and Optical Property of RF-PACVD-Derived Hydrogenated SiCNO Film.
[Online-Edition: https://doi.org/10.1002/mawe.200600993]
In: Materialwissenschaft und Werkstofftechnik, 37 (2) pp. 173-177. ISSN 0933-5137
[Article] , (2006)

Zhou, Y. and Yan, X. and Kroke, E. and Riedel, R. and Probst, D. and Thissen, A. and Hauser, R. and Ahles, Marcus and von Seggern, Heinz :
Deposition temperature effect on the structure and optical property of RF-PACVD-derived hydrogenated.
In: Materialwissenschaft und Werkstofftechnik, 37 p. 173.
[Article] , (2006)

Zhou, Y. and Probst, D. and Thissen, A. and Kroke, E. and Riedel, R. and Hauser, R. and Hoche, H. and Bfroszeit, E. and Kroll, P. and Stafast, H. :
Hard Silicon carbonitride films obtained by RF-plasma-enhanced chemical yapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
In: Journal of the European Ceramic Society, 26 pp. 1325-1335.
[Article] , (2006)

Islam, A. B. M. O. and Thissen, A. and Klein, Andreas and Jaegermann, W. :
Deposition of the layered semiconductor SnS2 onto H-terminated Si(111) surfaces: Failure of van der Waals epitaxy and possible implications.
[Online-Edition: http://dx.doi.org/10.1016/j.susc.2004.09.030]
In: Surface Science, 572 (2-3) pp. 476-482. ISSN 00396028
[Article] , (2004)

Liu, G. and Klein, Andreas and Thissen, A. and Jaegermann, W. :
Electronic properties and interface characterization of phthalocyanine and Ru-polypyridine dyes on TiO2 surface.
[Online-Edition: http://dx.doi.org/10.1016/S0039-6028(03)00721-0]
In: Surface Science, 539 (1-3) pp. 37-48. ISSN 00396028
[Article] , (2003)

Kraft, D. and Weiler, U. and Tomm, Y. and Thissen, A. and Klein, Andreas and Jaegermann, W. :
Alternative back contacts for CdTe solar cells: a photoemission study of the VSe2/CdTe and TiSe2/CdTe interface formation.
[Online-Edition: http://dx.doi.org/10.1016/S0040-6090(03)00254-2]
In: Thin Solid Films, 431-432 pp. 382-386. ISSN 00406090
[Article] , (2003)

Kraft, D. and Thissen, A. and Broetz, J. and Flege, S. and Campo, M. and Klein, Andreas and Jaegermann, W. :
Characterization of tellurium layers for back contact formation on close to technology treated CdTe surfaces.
[Online-Edition: http://dx.doi.org/10.1063/1.1597757]
In: Journal of Applied Physics, 94 (5) pp. 3589-3598. ISSN 00218979
[Article] , (2003)

Fritsche, R. and Wisotzki, E. and Islam, A. B. M. O. and Thissen, A. and Klein, Andreas and Jaegermann, W. and Rudolph, R. and Tonti, D. and Pettenkofer, C. :
Electronic passivation of Si(111) by Ga–Se half-sheet termination.
[Online-Edition: http://dx.doi.org/10.1063/1.1454228]
In: Applied Physics Letters, 80 (8) pp. 1388-1390. ISSN 00036951
[Article] , (2002)

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