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Hard Silicon carbonitride films obtained by RF-plasma-enhanced chemical yapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide

Zhou, Y. and Probst, D. and Thissen, A. and Kroke, E. and Riedel, R. and Hauser, R. and Hoche, H. and Bfroszeit, E. and Kroll, P. and Stafast, H. (2006):
Hard Silicon carbonitride films obtained by RF-plasma-enhanced chemical yapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
26, In: Journal of the European Ceramic Society, pp. 1325-1335, [Article]

Item Type: Article
Erschienen: 2006
Creators: Zhou, Y. and Probst, D. and Thissen, A. and Kroke, E. and Riedel, R. and Hauser, R. and Hoche, H. and Bfroszeit, E. and Kroll, P. and Stafast, H.
Title: Hard Silicon carbonitride films obtained by RF-plasma-enhanced chemical yapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide
Language: English
Journal or Publication Title: Journal of the European Ceramic Society
Volume: 26
Divisions: 16 Department of Mechanical Engineering
Date Deposited: 20 Nov 2008 08:26
License: [undefiniert]
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