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Alkali ion intercalation in V2O5: Preparation and laboratory characterization of thin films produced by ALD

Donsanti, F. and Kostourou, K. and Decker, F. and Ibris, N. and Salvi, A. M. and Liberatore, M. and Thissen, A. and Jaegermann, W. and Lincot, D. (2006):
Alkali ion intercalation in V2O5: Preparation and laboratory characterization of thin films produced by ALD.
In: Surface and Interface Analysis, pp. 815-818, 38, (4), ISSN 0142-2421, [Online-Edition: http://dx.doi.org/10.1002/sia.2237],
[Article]

Abstract

Thin films of V2O5 act as performant alkali ion storage material, with applications mostly in Li microbatteries or in electrochromic windows. Oxide films less than 100 nm thick have been obtained by the Atomic Layer Deposition (ALD) method. The alkali ion insertion has been performed either via an electrochemical cathodic reaction in a non-aqueous solvent, or from the vapour phase in a vacuum chamber at RT. Both experimental procedures promoted the insertion of large amounts of the alkali ion with consequent reduction of the oxidation state of V, from 5+ to 4+ and even to 3+, measured with XPS-UPS. The reversibility of this reaction was a function of the amount of ionic charge inserted, of the substrate used (FTO, Cr-coated glass) and of the heat treatment adopted for the ALD film.

Item Type: Article
Erschienen: 2006
Creators: Donsanti, F. and Kostourou, K. and Decker, F. and Ibris, N. and Salvi, A. M. and Liberatore, M. and Thissen, A. and Jaegermann, W. and Lincot, D.
Title: Alkali ion intercalation in V2O5: Preparation and laboratory characterization of thin films produced by ALD
Language: English
Abstract:

Thin films of V2O5 act as performant alkali ion storage material, with applications mostly in Li microbatteries or in electrochromic windows. Oxide films less than 100 nm thick have been obtained by the Atomic Layer Deposition (ALD) method. The alkali ion insertion has been performed either via an electrochemical cathodic reaction in a non-aqueous solvent, or from the vapour phase in a vacuum chamber at RT. Both experimental procedures promoted the insertion of large amounts of the alkali ion with consequent reduction of the oxidation state of V, from 5+ to 4+ and even to 3+, measured with XPS-UPS. The reversibility of this reaction was a function of the amount of ionic charge inserted, of the substrate used (FTO, Cr-coated glass) and of the heat treatment adopted for the ALD film.

Journal or Publication Title: Surface and Interface Analysis
Volume: 38
Number: 4
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Zentrale Einrichtungen
DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres > CRC 595: Electrical fatigue
DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres > CRC 595: Electrical fatigue > A - Synthesis
DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres > CRC 595: Electrical fatigue > A - Synthesis > Subproject A3: Boundary layers and thin films of ionic conductors: Electronic structure, electrochemical potentials, defect formation and degradation mechanisms
DFG-Collaborative Research Centres (incl. Transregio) > Collaborative Research Centres
DFG-Collaborative Research Centres (incl. Transregio)
Date Deposited: 04 Aug 2011 09:13
Official URL: http://dx.doi.org/10.1002/sia.2237
Additional Information:

SFB 595 A3

Identification Number: doi:10.1002/sia.2237
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