Donsanti, F. ; Kostourou, K. ; Decker, F. ; Ibris, N. ; Salvi, A. M. ; Liberatore, M. ; Thissen, A. ; Jaegermann, W. ; Lincot, D. (2006)
Alkali ion intercalation in V2O5: Preparation and laboratory characterization of thin films produced by ALD.
In: Surface and Interface Analysis, 38 (4)
doi: 10.1002/sia.2237
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Thin films of V2O5 act as performant alkali ion storage material, with applications mostly in Li microbatteries or in electrochromic windows. Oxide films less than 100 nm thick have been obtained by the Atomic Layer Deposition (ALD) method. The alkali ion insertion has been performed either via an electrochemical cathodic reaction in a non-aqueous solvent, or from the vapour phase in a vacuum chamber at RT. Both experimental procedures promoted the insertion of large amounts of the alkali ion with consequent reduction of the oxidation state of V, from 5+ to 4+ and even to 3+, measured with XPS-UPS. The reversibility of this reaction was a function of the amount of ionic charge inserted, of the substrate used (FTO, Cr-coated glass) and of the heat treatment adopted for the ALD film.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2006 |
| Autor(en): | Donsanti, F. ; Kostourou, K. ; Decker, F. ; Ibris, N. ; Salvi, A. M. ; Liberatore, M. ; Thissen, A. ; Jaegermann, W. ; Lincot, D. |
| Art des Eintrags: | Bibliographie |
| Titel: | Alkali ion intercalation in V2O5: Preparation and laboratory characterization of thin films produced by ALD |
| Sprache: | Englisch |
| Publikationsjahr: | April 2006 |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Surface and Interface Analysis |
| Jahrgang/Volume einer Zeitschrift: | 38 |
| (Heft-)Nummer: | 4 |
| DOI: | 10.1002/sia.2237 |
| Kurzbeschreibung (Abstract): | Thin films of V2O5 act as performant alkali ion storage material, with applications mostly in Li microbatteries or in electrochromic windows. Oxide films less than 100 nm thick have been obtained by the Atomic Layer Deposition (ALD) method. The alkali ion insertion has been performed either via an electrochemical cathodic reaction in a non-aqueous solvent, or from the vapour phase in a vacuum chamber at RT. Both experimental procedures promoted the insertion of large amounts of the alkali ion with consequent reduction of the oxidation state of V, from 5+ to 4+ and even to 3+, measured with XPS-UPS. The reversibility of this reaction was a function of the amount of ionic charge inserted, of the substrate used (FTO, Cr-coated glass) and of the heat treatment adopted for the ALD film. |
| Zusätzliche Informationen: | SFB 595 A3 |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung Zentrale Einrichtungen DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche > SFB 595: Elektrische Ermüdung DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche > SFB 595: Elektrische Ermüdung > A - Synthese DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche > SFB 595: Elektrische Ermüdung > A - Synthese > Teilprojekt A3: Grenzflächen und dünne Schichten von Ionenleitern: Elektronische Struktur, elektrochemische Potentiale, Defektbildung und Degradationsmechanismen DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche DFG-Sonderforschungsbereiche (inkl. Transregio) |
| Hinterlegungsdatum: | 04 Aug 2011 09:13 |
| Letzte Änderung: | 23 Mär 2015 16:34 |
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