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Deposition Temperature Effect on the Structure and Optical Property of RF-PACVD-Derived Hydrogenated SiCNO Film

Zhou, Y. and Yan, X. and Kroke, E. and Riedel, R. and Probst, D. and Thissen, A. and Hauser, R. and Ahles, M. and von Seggern, H. (2006):
Deposition Temperature Effect on the Structure and Optical Property of RF-PACVD-Derived Hydrogenated SiCNO Film.
In: Materialwissenschaft und Werkstofftechnik, 37 (2), pp. 173-177. Wiley-VCH Verlag GmbH, Weinheim, ISSN 0933-5137,
DOI: 10.1002/mawe.200600993,
[Article]

Abstract

Amorphous hydrogenated silicon oxocarbonitride (SiCNO:H) films have been deposited by plasma‐assisted chemical vapour deposition (PACVD) using bis(trimethylsilyl)carbodiimide (BTSC) as a single source precursor in a argon (Ar) radio‐frequency plasma. In this work the SiCNO:H films deposited at different deposition temperatures were studied in terms of deposition rate, refractive index, surface roughness, microstructure, and chemical composition including bonding state. The results showed that a higher deposition temperature enhanced the formation of Si‐N bonds, and disfavoured the formation of N=C=N, Si‐NCN, C‐H and Si‐CH3 bonds. A higher deposition temperature also decreased the deposition rate and increased the refractive index of the resulting SiCNO:H film. With increasing temperature a denser film was formed, indicating a change of the deposition mechanism, i.e., transformation from particle precipitation to heterogeneous surface reaction. Except for the coatings deposited at room temperature, the surface of the films was smooth with a roughness of around 4 nm at the centre in the range of 5 μm x 5 μm area. Moreover, the films contained 8 ∼ 16 at.% oxygen bonded to Si, which originated from the remnant H2O in the deposition chamber.

Item Type: Article
Erschienen: 2006
Creators: Zhou, Y. and Yan, X. and Kroke, E. and Riedel, R. and Probst, D. and Thissen, A. and Hauser, R. and Ahles, M. and von Seggern, H.
Title: Deposition Temperature Effect on the Structure and Optical Property of RF-PACVD-Derived Hydrogenated SiCNO Film
Language: English
Abstract:

Amorphous hydrogenated silicon oxocarbonitride (SiCNO:H) films have been deposited by plasma‐assisted chemical vapour deposition (PACVD) using bis(trimethylsilyl)carbodiimide (BTSC) as a single source precursor in a argon (Ar) radio‐frequency plasma. In this work the SiCNO:H films deposited at different deposition temperatures were studied in terms of deposition rate, refractive index, surface roughness, microstructure, and chemical composition including bonding state. The results showed that a higher deposition temperature enhanced the formation of Si‐N bonds, and disfavoured the formation of N=C=N, Si‐NCN, C‐H and Si‐CH3 bonds. A higher deposition temperature also decreased the deposition rate and increased the refractive index of the resulting SiCNO:H film. With increasing temperature a denser film was formed, indicating a change of the deposition mechanism, i.e., transformation from particle precipitation to heterogeneous surface reaction. Except for the coatings deposited at room temperature, the surface of the films was smooth with a roughness of around 4 nm at the centre in the range of 5 μm x 5 μm area. Moreover, the films contained 8 ∼ 16 at.% oxygen bonded to Si, which originated from the remnant H2O in the deposition chamber.

Journal or Publication Title: Materialwissenschaft und Werkstofftechnik
Journal volume: 37
Number: 2
Publisher: Wiley-VCH Verlag GmbH, Weinheim
Uncontrolled Keywords: Amorphous SiCNO:H, RF‐PACVD, Structure, Optical Properties, Amorphes Si‐CNO:H, RF‐PACVD, Struktur, optische Eigenschaften
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Dispersive Solids
11 Department of Materials and Earth Sciences > Material Science > Electronic Materials
Date Deposited: 17 Dec 2018 13:01
DOI: 10.1002/mawe.200600993
Official URL: https://doi.org/10.1002/mawe.200600993
Additional Information:

Dedicated to Dr. E. Broszeit on the occasion of his 65th birthday.

Funders: This work woas funded by the DFG within the framework of DFG-SPP1119:“InorganicMaterialsbyGasPhaseDeposition: Interdisciplinary Approaches to Development, Understanding and Control of CVD-Techniques”.
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