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Gruppiere nach: Keine Gruppierung | Typ des Eintrags | Publikationsjahr | Sprache
Springe zu: 2020 | 2019 | 2018 | 2017 | 2016 | 2014 | 2012 | 2010 | 2009 | 2001
Anzahl der Einträge: 14.

2020

Hatada, R. ; Flege, S. ; Ensinger, W. ; Baba, K. (2020)
Deposition of diamond-like carbon films on insulating substrates by plasma source ion implantation.
In: Surface and Coatings Technology, 385
doi: 10.1016/j.surfcoat.2020.125426
Artikel, Bibliographie

2019

Saha, S. ; Das, A. K. ; Hatada, R. ; Ensinger, W. ; Flege, S. ; Baba, K. ; Meikap, A. K. (2019)
Electrical transport properties of Ni-doped diamond-like carbon films at and above room temperature.
In: Journal of Applied Physics, 126 (15)
doi: 10.1063/1.5118871
Artikel, Bibliographie

2018

Das, A. K. ; Hatada, R. ; Ensinger, W. ; Flege, S. ; Baba, K. ; Meikap, A. K. (2018)
Dielectric constant, AC conductivity and impedance spectroscopy of zinc-containing diamond-like carbon film UV photodetector.
In: Journal of Alloys and Compounds, 758
doi: 10.1016/j.jallcom.2018.05.121
Artikel, Bibliographie

Inoi, T. ; Baba, K. ; Flege, S. ; Hatada, R. ; Ensinger, W. (2018)
Preparation of iodine containing diamond-like carbon films by trifluoroiodomethane.
In: Materials Letters, 215
doi: 10.1016/j.matlet.2017.12.061
Artikel, Bibliographie

Hatada, R. ; Flege, S. ; Ensinger, W. ; Baba, K. (2018)
Preparation of anatase films from titanium containing diamond-like carbon films.
In: Materials Letters, 213
doi: 10.1016/j.matlet.2017.11.034
Artikel, Bibliographie

Inoi, T. ; Baba, K. ; Flege, S. ; Hatada, R. ; Ensinger, W. (2018)
Properties of iodine containing diamond-like carbon films prepared by plasma source ion implantation.
In: Diamond and Related Materials, 81
doi: 10.1016/j.diamond.2017.11.013
Artikel, Bibliographie

2017

Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K. (2017)
Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition.
In: Review of Scientific Instruments, 88 (9)
doi: 10.1063/1.4995080
Artikel, Bibliographie

Flege, S. ; Hatada, R. ; Vogel, T. ; Bruder, E. ; Major, M. ; Ensinger, W. ; Baba, K. (2017)
Tightly adhering diamond-like carbon films on copper substrates by oxygen pre-implantation.
In: Surface and Coatings Technology, 335
doi: 10.1016/j.surfcoat.2017.12.029
Artikel, Bibliographie

2016

Flege, S. ; Hatada, R. ; Kaiser, T. ; Muench, F. ; Cherkashinin, G. ; Schwöbel, A. ; Ensinger, W. ; Baba, K. (2016)
Use of a nanostructured surface coating to achieve higher sputter rates.
In: Materials Letters, 164
doi: 10.1016/j.matlet.2015.11.059
Artikel, Bibliographie

2014

Hatada, R. ; Flege, S. ; Bobrich, A. ; Ensinger, W. ; Dietz, C. ; Baba, K. ; Sawase, T. ; Watamoto, T. ; Matsutani, T. (2014)
Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering.
In: Applied Surface Science, 310
doi: 10.1016/j.apsusc.2014.03.071
Artikel, Bibliographie

2012

Baba, K. ; Hatada, R. ; Flege, S. ; Ensinger, W. (2012)
Preparation and Properties of Ag-Containing Diamond-Like Carbon Films by Magnetron Plasma Source Ion Implantation.
In: Advances in Materials Science and Engineering, 2012
doi: 10.1155/2012/536853
Artikel, Bibliographie

2010

Hatada, R. ; Flege, S. ; Baba, K. ; Ensinger, W. ; Kleebe, H.-J. ; Sethmann, I. ; Lauterbach, S. (2010)
Temperature dependent properties of silicon containing diamondlike carbon films prepared by plasma source ion implantation.
In: Journal of Applied Physics, 107 (8)
doi: 10.1063/1.3394002
Artikel, Bibliographie

2009

Flege, S. ; Kraft, G. ; Bruder, E. ; Baba, K. ; Hatada, R. ; Ensinger, W. (2009)
Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation.
In: Journal of Applied Physics 106, 106 (2)
Artikel, Bibliographie

2001

Volz, K. ; Baba, K. ; Hatada, R. ; Ensinger, W. (2001)
Silicon carbide and amorphous carbon film formation by plasma immersion ion implantation: a comparison of methane and toluene as plasma forming gases.
In: Surface & coatings technology, 136 (1-3)
doi: 10.1016/S0257-8972(00)01055-0
Artikel, Bibliographie

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