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Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition

Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K. (2017):
Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition.
In: Review of Scientific Instruments, 88 (9), pp. 096106. AIP Publications, ISSN 0034-6748,
DOI: 10.1063/1.4995080,
[Article]

Abstract

A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.

Item Type: Article
Erschienen: 2017
Creators: Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K.
Title: Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition
Language: English
Abstract:

A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.

Journal or Publication Title: Review of Scientific Instruments
Journal volume: 88
Number: 9
Publisher: AIP Publications
Uncontrolled Keywords: Etching, Thin films, Analytical chemistry, Carbon based materials, Ceramics
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science > Physics of Surfaces
Date Deposited: 28 Dec 2017 12:03
DOI: 10.1063/1.4995080
Official URL: https://doi.org/10.1063/1.4995080
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