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Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition

Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K. (2017)
Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition.
In: Review of Scientific Instruments, 88 (9)
doi: 10.1063/1.4995080
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.

Typ des Eintrags: Artikel
Erschienen: 2017
Autor(en): Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K.
Art des Eintrags: Bibliographie
Titel: Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition
Sprache: Englisch
Publikationsjahr: September 2017
Verlag: AIP Publications
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Review of Scientific Instruments
Jahrgang/Volume einer Zeitschrift: 88
(Heft-)Nummer: 9
DOI: 10.1063/1.4995080
URL / URN: https://doi.org/10.1063/1.4995080
Kurzbeschreibung (Abstract):

A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.

Freie Schlagworte: Etching, Thin films, Analytical chemistry, Carbon based materials, Ceramics
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Physics of Surfaces
Hinterlegungsdatum: 28 Dez 2017 12:03
Letzte Änderung: 08 Jan 2018 06:48
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