Hatada, R. ; Flege, S. ; Ensinger, W. ; Baba, K. (2020):
Deposition of diamond-like carbon films on insulating substrates by plasma source ion implantation.
In: Surface and Coatings Technology, 385, p. 125426. Elsevier B.V., ISSN 02578972,
DOI: 10.1016/j.surfcoat.2020.125426,
[Article]

Saha, S. ; Das, A. K. ; Hatada, R. ; Ensinger, W. ; Flege, S. ; Baba, K. ; Meikap, A. K. (2019):
Electrical transport properties of Ni-doped diamond-like carbon films at and above room temperature.
In: Journal of Applied Physics, 126 (15), p. 154104. AIP Publishing, ISSN 0021-8979,
DOI: 10.1063/1.5118871,
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Das, A. K. ; Hatada, R. ; Ensinger, W. ; Flege, S. ; Baba, K. ; Meikap, A. K. (2018):
Dielectric constant, AC conductivity and impedance spectroscopy of zinc-containing diamond-like carbon film UV photodetector.
In: Journal of Alloys and Compounds, 758, pp. 194-205. Elsevier Science Publishing, ISSN 09258388,
DOI: 10.1016/j.jallcom.2018.05.121,
[Article]

Inoi, T. ; Baba, K. ; Flege, S. ; Hatada, R. ; Ensinger, W. (2018):
Preparation of iodine containing diamond-like carbon films by trifluoroiodomethane.
In: Materials Letters, 215, pp. 68-70. Elsevier Science Publishing, ISSN 0167577X,
DOI: 10.1016/j.matlet.2017.12.061,
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Hatada, R. ; Flege, S. ; Ensinger, W. ; Baba, K. (2018):
Preparation of anatase films from titanium containing diamond-like carbon films.
In: Materials Letters, 213, pp. 148-150. Elsevier Science Publishing, ISSN 0167577X,
DOI: 10.1016/j.matlet.2017.11.034,
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Inoi, T. ; Baba, K. ; Flege, S. ; Hatada, R. ; Ensinger, W. (2018):
Properties of iodine containing diamond-like carbon films prepared by plasma source ion implantation.
In: Diamond and Related Materials, 81, pp. 108-112. Elsevier Science Publishing, ISSN 09259635,
DOI: 10.1016/j.diamond.2017.11.013,
[Article]

Flege, S. ; Hatada, R. ; Derepa, A. ; Dietz, C. ; Ensinger, W. ; Baba, K. (2017):
Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition.
In: Review of Scientific Instruments, 88 (9), pp. 096106. AIP Publications, ISSN 0034-6748,
DOI: 10.1063/1.4995080,
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Flege, S. ; Hatada, R. ; Vogel, T. ; Bruder, E. ; Major, M. ; Ensinger, W. ; Baba, K. (2017):
Tightly adhering diamond-like carbon films on copper substrates by oxygen pre-implantation.
In: Surface and Coatings Technology, 335, pp. 134-139. Elsevier Science Publishing, ISSN 02578972,
DOI: 10.1016/j.surfcoat.2017.12.029,
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Flege, S. ; Hatada, R. ; Kaiser, T. ; Muench, F. ; Cherkashinin, G. ; Schwöbel, A. ; Ensinger, W. ; Baba, K. (2016):
Use of a nanostructured surface coating to achieve higher sputter rates.
In: Materials Letters, 164, pp. 532-534. ISSN 0167-577X,
[Article]

Hatada, R. ; Flege, S. ; Bobrich, A. ; Ensinger, W. ; Dietz, C. ; Baba, K. ; Sawase, T. ; Watamoto, T. ; Matsutani, T. (2014):
Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering.
In: Applied Surface Science, 310, pp. 257-261. ELSEVIER SCIENCE BV, AMSTERDAM, NETHERLANDS, ISSN 01694332,
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Baba, K. ; Hatada, R. ; Flege, S. ; Ensinger, W. (2012):
Preparation and Properties of Ag-Containing Diamond-Like Carbon Films by Magnetron Plasma Source Ion Implantation.
In: Advances in Materials Science and Engineering, 2012, pp. 1-5. Hindawi Publishing Corporation, ISSN 1687-8434,
[Article]

Hatada, R. ; Flege, S. ; Baba, K. ; Ensinger, W. ; Kleebe, H.-J. ; Sethmann, I. ; Lauterbach, S. (2010):
Temperature dependent properties of silicon containing diamondlike carbon films prepared by plasma source ion implantation.
In: Journal of Applied Physics, 107 (8), pp. 083307. AIP, ISSN 0021-8979,
DOI: 10.1063/1.3394002,
[Article]

Flege, S. ; Kraft, G. ; Bruder, E. ; Baba, K. ; Hatada, R. ; Ensinger, W. (2009):
Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation.
In: Journal of Applied Physics 106, 106 (2), pp. 023302. American Institute of Physics, [Article]

Volz, K. ; Baba, K. ; Hatada, R. ; Ensinger, W. (2001):
Silicon carbide and amorphous carbon film formation by plasma immersion ion implantation: a comparison of methane and toluene as plasma forming gases.
In: Surface & coatings technology, 136 (1-3), pp. 197-201. ISSN 0257-8972,
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