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Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation

Flege, S. ; Kraft, G. ; Bruder, E. ; Baba, K. ; Hatada, R. ; Ensinger, W. (2009)
Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation.
In: Journal of Applied Physics 106, 106 (2)
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

The sputter rate influences the resulting thickness of the carbon containing layer within a surface that was treated by plasma immersion ion implantation. Choosing a polycrystalline substrate with rather large crystals and a material with an inherent high sputter rate, inhomogeneous distributions of carbon over the substrate area due to different thicknesses of the incorporated carbon can be detected. A correlation of three factors namely the carbon x-ray intensity in electron probe microanalysis, the thickness of the carbon layer, and the sputter rate in depth profiling measurements via secondary ion mass spectrometry can be shown. Essential for these factors is the crystal orientation that is visualized by mapping via electron backscatter diffraction. The differences in carbon content due to the orientation are most likely one of the reasons that the adhesion of diamond-like carbon films on copper does not improve with an interlayer of implanted carbon.

Typ des Eintrags: Artikel
Erschienen: 2009
Autor(en): Flege, S. ; Kraft, G. ; Bruder, E. ; Baba, K. ; Hatada, R. ; Ensinger, W.
Art des Eintrags: Bibliographie
Titel: Influence of sputter rate and crystal orientation on the distribution of carbon in polycrystalline copper surfaces treated by plasma immersion ion implantation
Sprache: Englisch
Publikationsjahr: 20 Juli 2009
Verlag: American Institute of Physics
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Journal of Applied Physics 106
Jahrgang/Volume einer Zeitschrift: 106
(Heft-)Nummer: 2
Kurzbeschreibung (Abstract):

The sputter rate influences the resulting thickness of the carbon containing layer within a surface that was treated by plasma immersion ion implantation. Choosing a polycrystalline substrate with rather large crystals and a material with an inherent high sputter rate, inhomogeneous distributions of carbon over the substrate area due to different thicknesses of the incorporated carbon can be detected. A correlation of three factors namely the carbon x-ray intensity in electron probe microanalysis, the thickness of the carbon layer, and the sputter rate in depth profiling measurements via secondary ion mass spectrometry can be shown. Essential for these factors is the crystal orientation that is visualized by mapping via electron backscatter diffraction. The differences in carbon content due to the orientation are most likely one of the reasons that the adhesion of diamond-like carbon films on copper does not improve with an interlayer of implanted carbon.

Freie Schlagworte: adhesion, carbon, copper, crystal orientation, electron backscattering, electron diffraction, electron probe analysis, grain boundaries, plasma immersion ion implantation, polishing, secondary ion mass spectra, sputter deposition, thin films
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Physikalische Metallkunde
DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche > SFB 666: Integrale Blechbauweisen höherer Verzweigungsordnung
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Zentrale Einrichtungen
DFG-Sonderforschungsbereiche (inkl. Transregio) > Sonderforschungsbereiche
DFG-Sonderforschungsbereiche (inkl. Transregio)
Hinterlegungsdatum: 04 Apr 2011 13:40
Letzte Änderung: 05 Mär 2013 09:46
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