Hatada, R. and Flege, S. and Baba, K. and Ensinger, W. and Kleebe, H.-J. and Sethmann, I. and Lauterbach, S. (2010):
Temperature dependent properties of silicon containing diamondlike carbon films prepared by plasma source ion implantation.
In: Journal of Applied Physics, 107 (8), pp. 083307. AIP, ISSN 00218979,
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