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Hatada, R. and Flege, S. and Baba, K. and Ensinger, W. and Kleebe, H.-J. and Sethmann, I. and Lauterbach, S. (2010):
Temperature dependent properties of silicon containing diamondlike carbon films prepared by plasma source ion implantation.
In: Journal of Applied Physics, 107 (8), AIP, pp. 083307, ISSN 00218979,
[Online-Edition: http://dx.doi.org/10.1063/1.3394002],
[Article]
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