TU Darmstadt / ULB / TUbiblio

Depositon of Dielectric Films with Inductively Coupled Plasma-CVD in Dependence on Pressure and Two RF-Power-Sources

Jatta, Sandro and Haberle, Klaus and Klein, Andreas and Schafranek, Robert and Koegel, Benjamin and Meissner, Peter (2009):
Depositon of Dielectric Films with Inductively Coupled Plasma-CVD in Dependence on Pressure and Two RF-Power-Sources.
In: Plasma Processes and Polymers, pp. S582, 6, (S1), ISSN 16128850,
[Online-Edition: http://dx.doi.org/10.1002/ppap.200931405],
[Article]

Item Type: Article
Erschienen: 2009
Creators: Jatta, Sandro and Haberle, Klaus and Klein, Andreas and Schafranek, Robert and Koegel, Benjamin and Meissner, Peter
Title: Depositon of Dielectric Films with Inductively Coupled Plasma-CVD in Dependence on Pressure and Two RF-Power-Sources
Language: English
Journal or Publication Title: Plasma Processes and Polymers
Volume: 6
Number: S1
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
Date Deposited: 29 Oct 2011 08:16
Official URL: http://dx.doi.org/10.1002/ppap.200931405
Identification Number: doi:10.1002/ppap.200931405
Export:
Suche nach Titel in: TUfind oder in Google

Optionen (nur für Redakteure)

View Item View Item