Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert (2006)
Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
In: Journal of the European Ceramic Society, 26 (8)
doi: 10.1016/j.jeurceramsoc.2005.02.004
Artikel, Bibliographie

Probst, Daniel ; Hoche, Holger ; Zhou, Yanping ; Hauser, Ralf ; Stelzner, Thomas ; Scheerer, Herbert ; Broszeit, Erhard ; Berger, Christina ; Riedel, Ralf ; Stafast, Herbert ; Kroke, Edwin (2005)
Development of PE-CVD Si/C/N:H films for tribological and corrosive complex-load conditions.
In: Surface and Coatings Technology, 200 (1-4)
doi: 10.1016/j.surfcoat.2005.02.111
Artikel, Bibliographie

Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert (2005)
Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide.
In: Journal of the European Ceramic Society, 26
Artikel, Bibliographie

Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger (2005)
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, 200
Artikel, Bibliographie

Berger, Christina ; Broszeit, Erhard ; Falk, F. ; Hoche, Holger ; Kroke, Edwin ; Kroll, Peter ; Probst, Daniel ; Riedel, Ralf ; Stafast, Herbert ; Uhlitzsch, V. ; Zhou, Yanping (2003)
Plasma CVD of Si/C/N : experimental and theoretical results.
Konferenzveröffentlichung, Bibliographie