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Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry

Stelzner, Thomas and Arold, M. and Falk, F. and Stafast, Herbert and Probst, Daniel and Hoche, Holger (2005):
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, 200. pp. 372-376, [Article]

Item Type: Article
Erschienen: 2005
Creators: Stelzner, Thomas and Arold, M. and Falk, F. and Stafast, Herbert and Probst, Daniel and Hoche, Holger
Title: Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry
Language: English
Journal or Publication Title: Surface & coatings technology
Journal volume: 200
Divisions: 11 Department of Materials and Earth Sciences
Date Deposited: 20 Nov 2008 08:23
License: [undefiniert]
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