Stelzner, Thomas and Arold, M. and Falk, F. and Stafast, Herbert and Probst, Daniel and Hoche, Holger (2005):
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, 200, pp. 372-376. [Article]
Item Type: | Article |
---|---|
Erschienen: | 2005 |
Creators: | Stelzner, Thomas and Arold, M. and Falk, F. and Stafast, Herbert and Probst, Daniel and Hoche, Holger |
Title: | Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry |
Language: | English |
Journal or Publication Title: | Surface & coatings technology |
Journal volume: | 200 |
Divisions: | 11 Department of Materials and Earth Sciences |
Date Deposited: | 20 Nov 2008 08:23 |
License: | [undefiniert] |
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Suche nach Titel in: | TUfind oder in Google |
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