Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger (2005):
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, 200, pp. 372-376. [Article]
| Item Type: | Article |
|---|---|
| Erschienen: | 2005 |
| Creators: | Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger |
| Title: | Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry |
| Language: | English |
| Journal or Publication Title: | Surface & coatings technology |
| Journal Volume: | 200 |
| Divisions: | 11 Department of Materials and Earth Sciences |
| Date Deposited: | 20 Nov 2008 08:23 |
| License: | [undefiniert] |
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