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Berger, Christina and Broszeit, Erhard and Falk, F. and Hoche, Holger and Kroke, Edwin and Kroll, Peter and Probst, Daniel and Riedel, Ralf and Stafast, Herbert and Uhlitzsch, V. and Zhou, Yanping (2003):
Plasma CVD of Si/C/N : experimental and theoretical results.
In: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium ...in Paris, France, April 27-May 2, 2003.- Vol. 1. 2003.- ISBN 1-566-77380-6. - S. 646-652, [Conference or Workshop Item]

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