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Development of PE-CVD Si/C/N:H films for tribological and corrosive complex-load conditions

Probst, Daniel ; Hoche, Holger ; Zhou, Yanping ; Hauser, Ralf ; Stelzner, Thomas ; Scheerer, Herbert ; Broszeit, Erhard ; Berger, Christina ; Riedel, Ralf ; Stafast, Herbert ; Kroke, Edwin (2005)
Development of PE-CVD Si/C/N:H films for tribological and corrosive complex-load conditions.
In: Surface and Coatings Technology, 200 (1-4)
doi: 10.1016/j.surfcoat.2005.02.111
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Amorphous Si/C/N:H where synthesized by plasma enhanced chemical vapor deposition (PE-CVD) using the single-source precursors hexamethyldisilazane (HMDS) and bis(trimethylsilyl)carbodiimide (BTSC). The films produced using the HMDS precursor were rich in carbon, while the films synthesized from the BTSC precursor were high in nitrogen content. All films were amorphous and exhibited a similar hardness to SiC or Si3N4. Fundamental properties of the films were determined in tests such as ultra micro-hardness, elastic modulus, thickness and adhesion. To investigate the composition of the films, composition depth profiles were determined by GDOES. The wear behaviour was studied in sliding tests under oscillating motion. To investigate the wear mechanisms, the wear tracks were examined with topographical analysis, REM as well as EDX.

Typ des Eintrags: Artikel
Erschienen: 2005
Autor(en): Probst, Daniel ; Hoche, Holger ; Zhou, Yanping ; Hauser, Ralf ; Stelzner, Thomas ; Scheerer, Herbert ; Broszeit, Erhard ; Berger, Christina ; Riedel, Ralf ; Stafast, Herbert ; Kroke, Edwin
Art des Eintrags: Bibliographie
Titel: Development of PE-CVD Si/C/N:H films for tribological and corrosive complex-load conditions
Sprache: Englisch
Publikationsjahr: 1 Oktober 2005
Verlag: Elsevier
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Surface and Coatings Technology
Jahrgang/Volume einer Zeitschrift: 200
(Heft-)Nummer: 1-4
DOI: 10.1016/j.surfcoat.2005.02.111
Kurzbeschreibung (Abstract):

Amorphous Si/C/N:H where synthesized by plasma enhanced chemical vapor deposition (PE-CVD) using the single-source precursors hexamethyldisilazane (HMDS) and bis(trimethylsilyl)carbodiimide (BTSC). The films produced using the HMDS precursor were rich in carbon, while the films synthesized from the BTSC precursor were high in nitrogen content. All films were amorphous and exhibited a similar hardness to SiC or Si3N4. Fundamental properties of the films were determined in tests such as ultra micro-hardness, elastic modulus, thickness and adhesion. To investigate the composition of the films, composition depth profiles were determined by GDOES. The wear behaviour was studied in sliding tests under oscillating motion. To investigate the wear mechanisms, the wear tracks were examined with topographical analysis, REM as well as EDX.

Freie Schlagworte: SiCN, PA-CVD, PE-CVD, Mechanical properties, Tribology
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Disperse Feststoffe
16 Fachbereich Maschinenbau
16 Fachbereich Maschinenbau > Fachgebiet und Institut für Werkstoffkunde - Zentrum für Konstruktionswerkstoffe - Staatliche Materialprüfungsanstalt Darmstadt (IfW-MPA)
Hinterlegungsdatum: 20 Apr 2012 11:22
Letzte Änderung: 30 Jan 2019 11:34
PPN:
Sponsoren: Financial support for the joint research project by the German Research Foundation, DFG (Bonn), in the framework of the priority program 1119 “Inorganic Materials by Gas Phase Synthesis” is gratefully acknowledged.
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