Berger, Christina ; Broszeit, Erhard ; Falk, F. ; Hoche, Holger ; Kroke, Edwin ; Kroll, Peter ; Probst, Daniel ; Riedel, Ralf ; Stafast, Herbert ; Uhlitzsch, V. ; Zhou, Yanping (2003)
Plasma CVD of Si/C/N : experimental and theoretical results.
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Kurzbeschreibung (Abstract)

Amorphous and crystalline silicon carbonitride materials have attracted great interest in recent years[1] due to outstanding oxidation resistance at elevated temperatures[2], high hardness[3] as well as excellent wear characteristics[4]. This study is focused on the synthesis of Si/C/N hard coatings on metal substrates for tribological applications. It is based on an interdisciplinary cooperation between four research institutes. Starting from single-source precursors, coatings were prepared using very similar PECVD devices at IPHT Jena and IFMS Darmstadt (Figs. 1 and 2). At Jena the CVD process is experimentally examined by laser assisted in situ mass spectrometry (Fig. 2). Quantum-theoretical calculations are used at RWTH Aachen in order to examine the species in the gas phase as well as surface reactions with the substrate and solid state structure-property relations. The mechanical and tribological characteristics important for industrial applications of the coatings and coatingsubstrate composites as well as the oxidation and corrosion behaviour (in particular at high temperatures) are examined at IfW. The overall objective of this joint research project is to gain a comprehensive understanding of the CVD process as a whole. First preliminary results are presented here.

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