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Plasma CVD of Si/C/N : experimental and theoretical results

Berger, Christina ; Broszeit, Erhard ; Falk, F. ; Hoche, Holger ; Kroke, Edwin ; Kroll, Peter ; Probst, Daniel ; Riedel, Ralf ; Stafast, Herbert ; Uhlitzsch, V. ; Zhou, Yanping :
Plasma CVD of Si/C/N : experimental and theoretical results.
In: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium ...in Paris, France, April 27-May 2, 2003.- Vol. 1. 2003.- ISBN 1-566-77380-6. - S. 646-652 .
[Konferenz- oder Workshop-Beitrag], (2003)

Kurzbeschreibung (Abstract)

Amorphous and crystalline silicon carbonitride materials have attracted great interest in recent years[1] due to outstanding oxidation resistance at elevated temperatures[2], high hardness[3] as well as excellent wear characteristics[4]. This study is focused on the synthesis of Si/C/N hard coatings on metal substrates for tribological applications. It is based on an interdisciplinary cooperation between four research institutes. Starting from single-source precursors, coatings were prepared using very similar PECVD devices at IPHT Jena and IFMS Darmstadt (Figs. 1 and 2). At Jena the CVD process is experimentally examined by laser assisted in situ mass spectrometry (Fig. 2). Quantum-theoretical calculations are used at RWTH Aachen in order to examine the species in the gas phase as well as surface reactions with the substrate and solid state structure-property relations. The mechanical and tribological characteristics important for industrial applications of the coatings and coatingsubstrate composites as well as the oxidation and corrosion behaviour (in particular at high temperatures) are examined at IfW. The overall objective of this joint research project is to gain a comprehensive understanding of the CVD process as a whole. First preliminary results are presented here.

Typ des Eintrags: Konferenz- oder Workshop-Beitrag (Keine Angabe)
Erschienen: 2003
Autor(en): Berger, Christina ; Broszeit, Erhard ; Falk, F. ; Hoche, Holger ; Kroke, Edwin ; Kroll, Peter ; Probst, Daniel ; Riedel, Ralf ; Stafast, Herbert ; Uhlitzsch, V. ; Zhou, Yanping
Titel: Plasma CVD of Si/C/N : experimental and theoretical results
Sprache: Englisch
Kurzbeschreibung (Abstract):

Amorphous and crystalline silicon carbonitride materials have attracted great interest in recent years[1] due to outstanding oxidation resistance at elevated temperatures[2], high hardness[3] as well as excellent wear characteristics[4]. This study is focused on the synthesis of Si/C/N hard coatings on metal substrates for tribological applications. It is based on an interdisciplinary cooperation between four research institutes. Starting from single-source precursors, coatings were prepared using very similar PECVD devices at IPHT Jena and IFMS Darmstadt (Figs. 1 and 2). At Jena the CVD process is experimentally examined by laser assisted in situ mass spectrometry (Fig. 2). Quantum-theoretical calculations are used at RWTH Aachen in order to examine the species in the gas phase as well as surface reactions with the substrate and solid state structure-property relations. The mechanical and tribological characteristics important for industrial applications of the coatings and coatingsubstrate composites as well as the oxidation and corrosion behaviour (in particular at high temperatures) are examined at IfW. The overall objective of this joint research project is to gain a comprehensive understanding of the CVD process as a whole. First preliminary results are presented here.

Reihe: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium ...in Paris, France, April 27-May 2, 2003.- Vol. 1. 2003.- ISBN 1-566-77380-6. - S. 646-652
Fachbereich(e)/-gebiet(e): Fachbereich Material- und Geowissenschaften > Materialwissenschaften > Disperse Feststoffe, Dispersive Solids
Fachbereich Maschinenbau
Fachbereich Maschinenbau > Werkstoffkunde
Fachbereich Material- und Geowissenschaften > Materialwissenschaften
Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 20 Nov 2008 08:21
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