TU Darmstadt / ULB / TUbiblio

Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide

Zhou, Yanping and Probst, Daniel and Thissen, Andreas and Kroke, Edwin and Riedel, Ralf and Hauser, Ralf and Hoche, Holger and Broszeit, Erhard and Kroll, Peter and Stafast, Herbert (2005):
Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide.
In: Journal of the European Ceramic Society, pp. 1325-1335, 26, [Article]

Item Type: Article
Erschienen: 2005
Creators: Zhou, Yanping and Probst, Daniel and Thissen, Andreas and Kroke, Edwin and Riedel, Ralf and Hauser, Ralf and Hoche, Holger and Broszeit, Erhard and Kroll, Peter and Stafast, Herbert
Title: Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide
Language: English
Journal or Publication Title: Journal of the European Ceramic Society
Volume: 26
Divisions: 11 Department of Materials and Earth Sciences
Date Deposited: 20 Nov 2008 08:22
License: [undefiniert]
Export:

Optionen (nur für Redakteure)

View Item View Item