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Number of items: 2.

Stelzner, Thomas and Arold, M. and Falk, F. and Stafast, Herbert and Probst, Daniel and Hoche, Holger (2005):
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, pp. 372-376, 200, [Article]

Berger, Christina and Broszeit, Erhard and Falk, F. and Hoche, Holger and Kroke, Edwin and Kroll, Peter and Probst, Daniel and Riedel, Ralf and Stafast, Herbert and Uhlitzsch, V. and Zhou, Yanping (2003):
Plasma CVD of Si/C/N : experimental and theoretical results.
In: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium ...in Paris, France, April 27-May 2, 2003.- Vol. 1. 2003.- ISBN 1-566-77380-6. - S. 646-652, [Conference or Workshop Item]

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