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Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger (2005):
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, 200, pp. 372-376. [Article]

Berger, Christina ; Broszeit, Erhard ; Falk, F. ; Hoche, Holger ; Kroke, Edwin ; Kroll, Peter ; Probst, Daniel ; Riedel, Ralf ; Stafast, Herbert ; Uhlitzsch, V. ; Zhou, Yanping (2003):
Plasma CVD of Si/C/N : experimental and theoretical results.
In: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium ...in Paris, France, April 27-May 2, 2003.- Vol. 1. 2003.- ISBN 1-566-77380-6. - S. 646-652, [Conference or Workshop Item]

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