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Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide

Zhou, Yanping and Probst, Daniel and Thissen, Andreas and Kroke, Edwin and Riedel, Ralf and Hauser, Ralf and Hoche, Holger and Broszeit, Erhard and Kroll, Peter and Stafast, Herbert (2006):
Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
In: Journal of the European Ceramic Society, SciVerse, pp. 1325-1335, 26, (8), ISSN 09552219, [Online-Edition: http://dx.doi.org/10.1016/j.jeurceramsoc.2005.02.004],
[Article]

Abstract

Amorphous silicon carbon nitride (Si/C/N) coatings were prepared on steel substrates by RF plasma-enhanced chemical vapour deposition (RF-PECVD) from the single-source precursor bis(trimethylsilyl)carbodiimide (BTSC). The films were characterised by X-ray diffraction (XRD), ellipsometry, FTIR, glow discharge optical emission spectroscopy (GDOES), optical microscopy, AFM, hardness measurements, scratch-, tribological- and corrosion-tests. The results of these studies show that the coatings obtained on the RF-powered electrode (cathode) were black, thick (>20 μm) and hard (21–29 GPa), while those grown on the grounded electrode (anode) were yellow, thin (<4 μm) and soft (∼5 GPa). Coatings on the anode contained around 19 at.% oxygen and exhibited silicon predominantly bonded to oxygen. In contrast, the oxygen content of the films deposited on the cathode was below 2 at.%. Silicon atoms in these coatings are co-ordinated predominantly to nitrogen and carbon. The surface of all coatings was very smooth with a maximum rms roughness between 2 nm and 5 nm for an area of 5 μm × 5 μm. Scratch and tribological tests reveal a brittle nature of the cathode-coatings and rather weak adhesion to the metal substrates. Salt-spray tests indicate an excellent corrosion resistance of the material.

Item Type: Article
Erschienen: 2006
Creators: Zhou, Yanping and Probst, Daniel and Thissen, Andreas and Kroke, Edwin and Riedel, Ralf and Hauser, Ralf and Hoche, Holger and Broszeit, Erhard and Kroll, Peter and Stafast, Herbert
Title: Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide
Language: English
Abstract:

Amorphous silicon carbon nitride (Si/C/N) coatings were prepared on steel substrates by RF plasma-enhanced chemical vapour deposition (RF-PECVD) from the single-source precursor bis(trimethylsilyl)carbodiimide (BTSC). The films were characterised by X-ray diffraction (XRD), ellipsometry, FTIR, glow discharge optical emission spectroscopy (GDOES), optical microscopy, AFM, hardness measurements, scratch-, tribological- and corrosion-tests. The results of these studies show that the coatings obtained on the RF-powered electrode (cathode) were black, thick (>20 μm) and hard (21–29 GPa), while those grown on the grounded electrode (anode) were yellow, thin (<4 μm) and soft (∼5 GPa). Coatings on the anode contained around 19 at.% oxygen and exhibited silicon predominantly bonded to oxygen. In contrast, the oxygen content of the films deposited on the cathode was below 2 at.%. Silicon atoms in these coatings are co-ordinated predominantly to nitrogen and carbon. The surface of all coatings was very smooth with a maximum rms roughness between 2 nm and 5 nm for an area of 5 μm × 5 μm. Scratch and tribological tests reveal a brittle nature of the cathode-coatings and rather weak adhesion to the metal substrates. Salt-spray tests indicate an excellent corrosion resistance of the material.

Journal or Publication Title: Journal of the European Ceramic Society
Volume: 26
Number: 8
Publisher: SciVerse
Uncontrolled Keywords: Si/C/N, Films; Hardness, Wear resistance, PECVD
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Dispersive Solids
Date Deposited: 19 Apr 2012 11:25
Official URL: http://dx.doi.org/10.1016/j.jeurceramsoc.2005.02.004
Identification Number: doi:10.1016/j.jeurceramsoc.2005.02.004
Funders: This work was financially supported by the Deutsche Forschungsgemeinschaft (Bonn, Germany) within the framework of DFG-SPP 1119: “Inorganic Materials by Gas Phase Deposition: Interdisciplinary Approaches to Development, Understanding and Control of CVD-Te
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