Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert (2006)
Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
In: Journal of the European Ceramic Society, 26 (8)
doi: 10.1016/j.jeurceramsoc.2005.02.004
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Amorphous silicon carbon nitride (Si/C/N) coatings were prepared on steel substrates by RF plasma-enhanced chemical vapour deposition (RF-PECVD) from the single-source precursor bis(trimethylsilyl)carbodiimide (BTSC). The films were characterised by X-ray diffraction (XRD), ellipsometry, FTIR, glow discharge optical emission spectroscopy (GDOES), optical microscopy, AFM, hardness measurements, scratch-, tribological- and corrosion-tests. The results of these studies show that the coatings obtained on the RF-powered electrode (cathode) were black, thick (>20 μm) and hard (21–29 GPa), while those grown on the grounded electrode (anode) were yellow, thin (<4 μm) and soft (∼5 GPa). Coatings on the anode contained around 19 at.% oxygen and exhibited silicon predominantly bonded to oxygen. In contrast, the oxygen content of the films deposited on the cathode was below 2 at.%. Silicon atoms in these coatings are co-ordinated predominantly to nitrogen and carbon. The surface of all coatings was very smooth with a maximum rms roughness between 2 nm and 5 nm for an area of 5 μm × 5 μm. Scratch and tribological tests reveal a brittle nature of the cathode-coatings and rather weak adhesion to the metal substrates. Salt-spray tests indicate an excellent corrosion resistance of the material.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2006 |
| Autor(en): | Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert |
| Art des Eintrags: | Bibliographie |
| Titel: | Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide |
| Sprache: | Englisch |
| Publikationsjahr: | 2006 |
| Verlag: | SciVerse |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Journal of the European Ceramic Society |
| Jahrgang/Volume einer Zeitschrift: | 26 |
| (Heft-)Nummer: | 8 |
| DOI: | 10.1016/j.jeurceramsoc.2005.02.004 |
| Kurzbeschreibung (Abstract): | Amorphous silicon carbon nitride (Si/C/N) coatings were prepared on steel substrates by RF plasma-enhanced chemical vapour deposition (RF-PECVD) from the single-source precursor bis(trimethylsilyl)carbodiimide (BTSC). The films were characterised by X-ray diffraction (XRD), ellipsometry, FTIR, glow discharge optical emission spectroscopy (GDOES), optical microscopy, AFM, hardness measurements, scratch-, tribological- and corrosion-tests. The results of these studies show that the coatings obtained on the RF-powered electrode (cathode) were black, thick (>20 μm) and hard (21–29 GPa), while those grown on the grounded electrode (anode) were yellow, thin (<4 μm) and soft (∼5 GPa). Coatings on the anode contained around 19 at.% oxygen and exhibited silicon predominantly bonded to oxygen. In contrast, the oxygen content of the films deposited on the cathode was below 2 at.%. Silicon atoms in these coatings are co-ordinated predominantly to nitrogen and carbon. The surface of all coatings was very smooth with a maximum rms roughness between 2 nm and 5 nm for an area of 5 μm × 5 μm. Scratch and tribological tests reveal a brittle nature of the cathode-coatings and rather weak adhesion to the metal substrates. Salt-spray tests indicate an excellent corrosion resistance of the material. |
| Freie Schlagworte: | Si/C/N, Films; Hardness, Wear resistance, PECVD |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Disperse Feststoffe |
| Hinterlegungsdatum: | 19 Apr 2012 11:25 |
| Letzte Änderung: | 26 Aug 2018 21:27 |
| PPN: | |
| Sponsoren: | This work was financially supported by the Deutsche Forschungsgemeinschaft (Bonn, Germany) within the framework of DFG-SPP 1119: “Inorganic Materials by Gas Phase Deposition: Interdisciplinary Approaches to Development, Understanding and Control of CVD-Te |
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