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Group by: No Grouping | Item Type | Date | Language
Number of items: 5.

Article

Kerber, Andreas and Cartier, E. and Degraeve, R. and Roussel, Ph. and Pantisano, L. and Kauerauf, T. and Groeseneken, G. and Maes, H. E. and Schwalke, Udo (2004):
Charge Trapping and Dielectric Reliability of SiO2/Al2O3 Gate Stacks with TiN Electrodes.
In: Microelectronic Engineering, pp. 267-272, 72, (1-4), [Online-Edition: http://dx.doi.org/10.1016/j.mee.2004.01.002],
[Article]

Kerber, Andreas and Cartier, E. and Degraeve, R. and Roussel, Ph. and Pantisano, L. and Kauerauf, T. and Groeseneken, G. and Maes, H. E. and Schwalke, Udo (2003):
Charge Trapping and Dielectric Reliability of SiO2/Al2O3 Gate Stacks with TiN Electrodes.
In: IEEE Transactions on Electron Devices, pp. 1261-1269, 50, (5), [Online-Edition: http://dx.doi.org/10.1109/TED.2003.813486],
[Article]

Kerber, Andreas and Cartier, E. and Pantisano, L. and Rosmeulen, M. and Degraeve, R. and Kauerauf, T. and Groeseneken, G. and Maes, H. E. and Schwalke, Udo (2003):
Characterization of the VT Instability in SiO2/HfO2 Gate Dielectrics.
In: Proceedings of the IEEE International Reliability Physics Symposium (IRPS), pp. 41-45, [Online-Edition: http://dx.doi.org/10.1109/RELPHY.2003.1197718],
[Article]

Kerber, Andreas and Cartier, E. and Pantisano, L. and Degraeve, R. and Kauerauf, T. and Kim, Y. and Hou, A. and Groeseneken, G. and Maes, H. E. and Schwalke, Udo (2003):
Origin of the Threshold Voltage Instability in SiO2/HfO2 Dual Layer Gate Dielectrics.
In: IEEE Dlectron Device Letters, pp. 87-89, 24, (2), [Online-Edition: http://dx.doi.org/10.1109/LED.2003.808844],
[Article]

Conference or Workshop Item

Kerber, Andreas and Cartier, E. and Pantisano, L. and Degraeve, R. and Kim, Y. and Hou, A. and Groeseneken, G. and Maes, H. E. and Schwalke, Udo (2002):
Charging Instability in n-Channel MOS-FETs with SiO2/HfO2 Gate Dielectric.
In: IEEE Semiconductor Interface Specialist Conference, San Diego, CA, USA, 05.-07.12.2002, [Conference or Workshop Item]

This list was generated on Tue Nov 12 00:11:54 2019 CET.