Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert (2006):
Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
In: Journal of the European Ceramic Society, 26 (8), pp. 1325-1335. SciVerse, ISSN 09552219,
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Probst, Daniel ; Hoche, Holger ; Zhou, Yanping ; Hauser, Ralf ; Stelzner, Thomas ; Scheerer, Herbert ; Broszeit, Erhard ; Berger, Christina ; Riedel, Ralf ; Stafast, Herbert ; Kroke, Edwin (2005):
Development of PE-CVD Si/C/N:H films for tribological and corrosive complex-load conditions.
In: Surface and Coatings Technology, 200 (1-4), pp. 355-359. Elsevier, ISSN 02578972,
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Li, Jinwang ; Dzivenko, Dmytro ; Zerr, Andreas ; Fasel, Claudia ; Zhou, Yanping ; Riedel, Ralf (2005):
Synthesis of Nanocrystalline Zr3N4 and Hf3N4 Powders from Metal Dialkylamides.
In: Zeitschrift für anorganische und allgemeine Chemie, 631 (8), pp. 1449-1455. Wiley-VCH Verlag GmbH, Weinheim, ISSN 0044-2313,
DOI: 10.1002/zaac.200400539,
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Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert (2005):
Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide.
In: Journal of the European Ceramic Society, 26, pp. 1325-1335. [Article]

Berger, Christina ; Broszeit, Erhard ; Falk, F. ; Hoche, Holger ; Kroke, Edwin ; Kroll, Peter ; Probst, Daniel ; Riedel, Ralf ; Stafast, Herbert ; Uhlitzsch, V. ; Zhou, Yanping (2003):
Plasma CVD of Si/C/N : experimental and theoretical results.
In: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium ...in Paris, France, April 27-May 2, 2003.- Vol. 1. 2003.- ISBN 1-566-77380-6. - S. 646-652, [Conference or Workshop Item]