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Group by: No Grouping | Item Type | Date | Language
Number of items: 5.

Article

Zhou, Yanping and Probst, Daniel and Thissen, Andreas and Kroke, Edwin and Riedel, Ralf and Hauser, Ralf and Hoche, Holger and Broszeit, Erhard and Kroll, Peter and Stafast, Herbert (2006):
Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide.
In: Journal of the European Ceramic Society, SciVerse, pp. 1325-1335, 26, (8), ISSN 09552219,
[Online-Edition: http://dx.doi.org/10.1016/j.jeurceramsoc.2005.02.004],
[Article]

Probst, Daniel and Hoche, Holger and Zhou, Yanping and Hauser, Ralf and Stelzner, Thomas and Scheerer, Herbert and Broszeit, Erhard and Berger, Christina and Riedel, Ralf and Stafast, Herbert and Kroke, Edwin (2005):
Development of PE-CVD Si/C/N:H films for tribological and corrosive complex-load conditions.
In: Surface and Coatings Technology, Elsevier, pp. 355-359, 200, (1-4), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/j.surfcoat.2005.02.111],
[Article]

Li, Jinwang and Dzivenko, Dmytro and Zerr, Andreas and Fasel, Claudia and Zhou, Yanping and Riedel, Ralf (2005):
Synthesis of Nanocrystalline Zr3N4 and Hf3N4 Powders from Metal Dialkylamides.
In: Zeitschrift für anorganische und allgemeine Chemie, Wiley-VCH Verlag GmbH, Weinheim, pp. 1449-1455, 631, (8), ISSN 0044-2313,
DOI: 10.1002/zaac.200400539,
[Online-Edition: https://doi.org/10.1002/zaac.200400539],
[Article]

Zhou, Yanping and Probst, Daniel and Thissen, Andreas and Kroke, Edwin and Riedel, Ralf and Hauser, Ralf and Hoche, Holger and Broszeit, Erhard and Kroll, Peter and Stafast, Herbert (2005):
Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide.
In: Journal of the European Ceramic Society, pp. 1325-1335, 26, [Article]

Conference or Workshop Item

Berger, Christina and Broszeit, Erhard and Falk, F. and Hoche, Holger and Kroke, Edwin and Kroll, Peter and Probst, Daniel and Riedel, Ralf and Stafast, Herbert and Uhlitzsch, V. and Zhou, Yanping (2003):
Plasma CVD of Si/C/N : experimental and theoretical results.
In: Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium ...in Paris, France, April 27-May 2, 2003.- Vol. 1. 2003.- ISBN 1-566-77380-6. - S. 646-652, [Conference or Workshop Item]

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