Hegemann, Dirk ; Vohrer, U. ; Oehr, C. ; Riedel, Ralf (1999):
Deposition of SiOx films from O2/HMDSO plasmas.
In: SURFACE & COATINGS TECHNOLOGY, 116, pp. 1033-1036, Elsevier Science SA, Switzerland, th International Conference on Plasma Surface Engineering (PSE 98), Garmisch-Partenkirchen, GERMANY, SEP 14-18, 1998, DOI: 10.1016/S0257-8972(99)00092-4,
[Conference or Workshop Item]

Hegemann, Dirk ; Riedel, R. ; Oehr, C. (1999):
PACVD derived thin films in the system Si-B-C-N.
In: Chemical vapor deposition, 5 (2), pp. 61-65. Wiley, [Article]

Hegemann, Dirk ; Riedel, Ralf ; Oehr, C. (1999):
Influence of single-source precursors on PACVD-derived boron carbonitride thin films.
In: Thin Solid Films, 339 (1-2), pp. 154-159. Elsevier, ISSN 0040-6090,
[Article]

Hegemann, Dirk ; Riedel, R. ; Oehr, C. (1999):
Plasma deposition of hard and thermal resistant SiBCN coatings.
In: International Symposium on Plasma Chemistry <1999, Praha>: Proceedings. Hrsg.: M. Hrabovsky, [Conference or Workshop Item]

Hegemann, Dirk ; Riedel, R. ; Dreßler, W. ; Oehr, C. ; Schindler, B. ; Brunner, H. (1997):
Boron carbonitride thin films by PACVD of single source precursors.
In: Chemical Vapor Deposition, 3 (5), WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim, ISSN 0948-1907,
[Article]