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Influence of single-source precursors on PACVD-derived boron carbonitride thin films

Hegemann, Dirk and Riedel, Ralf and Oehr, C. (1999):
Influence of single-source precursors on PACVD-derived boron carbonitride thin films.
339, In: Thin solid films, (1-2), Elsevier, pp. 154-159, [Article]

Abstract

This work investigates the influence of the B/C/N containing single-source precursors pyridine-borane (PB) and triazaborabicyclodecane (TBBD) on the chemical composition of boron carbonitride thin films. The films are deposited via a PACVD process, activated by 13.56 MHz radio frequency (r.f.). N2, Ar and He serve as carrier gases. The chemical compositions of the coatings are analyzed by auger electron spectroscopy and the fragmentation of TBBD by mass spectrometry. It becomes evident, that from a certain bias voltage, the self-bias in capacitively r.f. electrical discharges mainly influences the chemical composition of the BCN films independent of the used precursor.

Item Type: Article
Erschienen: 1999
Creators: Hegemann, Dirk and Riedel, Ralf and Oehr, C.
Title: Influence of single-source precursors on PACVD-derived boron carbonitride thin films
Language: English
Abstract:

This work investigates the influence of the B/C/N containing single-source precursors pyridine-borane (PB) and triazaborabicyclodecane (TBBD) on the chemical composition of boron carbonitride thin films. The films are deposited via a PACVD process, activated by 13.56 MHz radio frequency (r.f.). N2, Ar and He serve as carrier gases. The chemical compositions of the coatings are analyzed by auger electron spectroscopy and the fragmentation of TBBD by mass spectrometry. It becomes evident, that from a certain bias voltage, the self-bias in capacitively r.f. electrical discharges mainly influences the chemical composition of the BCN films independent of the used precursor.

Journal or Publication Title: Thin solid films
Volume: 339
Number: 1-2
Publisher: Elsevier
Uncontrolled Keywords: Boron carbonitride, Pyridine-borane, Triazaborabicyclodecane, r.f. plasma, Self-bias
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Dispersive Solids
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 19 Nov 2008 16:23
Funders: R.R. gratefully acknowledges the financial support by the Fonds der Chemischen Industrie, Frankfurt.
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