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Deposition of SiOx films from O2/HMDSO plasmas

Hegemann, Dirk ; Vohrer, U. ; Oehr, C. ; Riedel, Ralf (1999)
Deposition of SiOx films from O2/HMDSO plasmas.
th International Conference on Plasma Surface Engineering (PSE 98). Garmisch-Partenkirchen, GERMANY (SEP 14-18, 1998)
doi: 10.1016/S0257-8972(99)00092-4
Konferenzveröffentlichung, Bibliographie

Kurzbeschreibung (Abstract)

The variation of O2/HMDSO ratio in an r.f. plasma was carried out to optimize SiOx film properties and deposition rates for the coating of polymers. A ratio exceeding 6:1 yields scratch resistant, quartz-like films with low carbon contents. The chemical composition was analyzed to SiO1.8C0.3 by XPS. A compact plasma reactor was developed generating homogeneous plasmas and depositions over large areas (up to 380×290 mm2). Furthermore, the total coverage of three-dimensional formed parts was managed with good adhesion of SiOx films to polymers like PC and PBT to reduce wear.

Typ des Eintrags: Konferenzveröffentlichung
Erschienen: 1999
Autor(en): Hegemann, Dirk ; Vohrer, U. ; Oehr, C. ; Riedel, Ralf
Art des Eintrags: Bibliographie
Titel: Deposition of SiOx films from O2/HMDSO plasmas
Sprache: Englisch
Publikationsjahr: September 1999
Verlag: Elsevier Science SA, Switzerland
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Surface and coatings technology
Reihe: SURFACE & COATINGS TECHNOLOGY
Band einer Reihe: 116
Veranstaltungstitel: th International Conference on Plasma Surface Engineering (PSE 98)
Veranstaltungsort: Garmisch-Partenkirchen, GERMANY
Veranstaltungsdatum: SEP 14-18, 1998
DOI: 10.1016/S0257-8972(99)00092-4
Kurzbeschreibung (Abstract):

The variation of O2/HMDSO ratio in an r.f. plasma was carried out to optimize SiOx film properties and deposition rates for the coating of polymers. A ratio exceeding 6:1 yields scratch resistant, quartz-like films with low carbon contents. The chemical composition was analyzed to SiO1.8C0.3 by XPS. A compact plasma reactor was developed generating homogeneous plasmas and depositions over large areas (up to 380×290 mm2). Furthermore, the total coverage of three-dimensional formed parts was managed with good adhesion of SiOx films to polymers like PC and PBT to reduce wear.

Freie Schlagworte: Adhesion, R.f. plasma, SiOx films
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Disperse Feststoffe
Hinterlegungsdatum: 19 Nov 2008 16:20
Letzte Änderung: 22 Aug 2018 08:16
PPN:
Sponsoren: Parts of this work were supported by the German Wirtschaftsministerium Baden Württemberg (reference no. 4-4332.62-IGB/1) as well as several industrial partners.
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