Hegemann, Dirk ; Riedel, R. ; Oehr, C. (1999)
PACVD derived thin films in the system Si-B-C-N.
In: Chemical vapor deposition, 5 (2)
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
PACVD has been used to obtain SiBCN thin films for the first time at low temperatures (250 °C) from a single-source precursor. In comparison with PACVD BCN, the B:C ratio is the same, but there is a slightly increased N content, and the presence of Si improves the hardness and adhesion characteristics. XPS and FTIR results suggest that most Si atoms are bonded to N and C, with the C being mainly sp2/sp3 hybridized C[BOND]C and C[BOND]N bonds, while B is bonded to N, also with sp2/sp3 hybridization.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 1999 |
| Autor(en): | Hegemann, Dirk ; Riedel, R. ; Oehr, C. |
| Art des Eintrags: | Bibliographie |
| Titel: | PACVD derived thin films in the system Si-B-C-N |
| Sprache: | Englisch |
| Publikationsjahr: | März 1999 |
| Verlag: | Wiley |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Chemical vapor deposition |
| Jahrgang/Volume einer Zeitschrift: | 5 |
| (Heft-)Nummer: | 2 |
| Kurzbeschreibung (Abstract): | PACVD has been used to obtain SiBCN thin films for the first time at low temperatures (250 °C) from a single-source precursor. In comparison with PACVD BCN, the B:C ratio is the same, but there is a slightly increased N content, and the presence of Si improves the hardness and adhesion characteristics. XPS and FTIR results suggest that most Si atoms are bonded to N and C, with the C being mainly sp2/sp3 hybridized C[BOND]C and C[BOND]N bonds, while B is bonded to N, also with sp2/sp3 hybridization. |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Disperse Feststoffe |
| Hinterlegungsdatum: | 19 Nov 2008 16:04 |
| Letzte Änderung: | 20 Feb 2020 13:28 |
| PPN: | |
| Sponsoren: | We thank the Fonds der Chemischen Industrie, Frankfurt, for financial support. |
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