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Jump to: 1999 | 1997
Number of items: 5.


Hegemann, Dirk and Vohrer, U. and Oehr, C. and Riedel, Ralf (1999):
Deposition of SiOx films from O2/HMDSO plasmas.
In: SURFACE & COATINGS TECHNOLOGY, 116, Elsevier Science SA, Switzerland, In: th International Conference on Plasma Surface Engineering (PSE 98), Garmisch-Partenkirchen, GERMANY, SEP 14-18, 1998, pp. 1033-1036, DOI: 10.1016/S0257-8972(99)00092-4,
[Conference or Workshop Item]

Hegemann, Dirk and Riedel, R. and Oehr, C. (1999):
PACVD derived thin films in the system Si-B-C-N.
5, In: Chemical vapor deposition, (2), Wiley, pp. 61-65, [Article]

Hegemann, Dirk and Riedel, Ralf and Oehr, C. (1999):
Influence of single-source precursors on PACVD-derived boron carbonitride thin films.
339, In: Thin solid films, (1-2), Elsevier, pp. 154-159, [Article]

Hegemann, Dirk and Riedel, R. and Oehr, C. (1999):
Plasma deposition of hard and thermal resistant SiBCN coatings.
In: International Symposium on Plasma Chemistry <1999, Praha>: Proceedings. Hrsg.: M. Hrabovsky, [Conference or Workshop Item]


Hegemann, Dirk and Riedel, R. and Dreßler, W. and Oehr, C. and Schindler, B. and Brunner, H. (1997):
Boron carbonitride thin films by PACVD of single source precursors.
In: Chemical vapor deposition. 3 (1997), S. 257-262, [Article]

This list was generated on Wed Dec 4 22:14:00 2019 CET.