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Number of items: 5.

Schmitt, L. A. ; Schrade, D. ; Kungl, H. ; Xu, B. X. ; Mueller, R. ; Hoffmann, M. J. ; Kleebe, H.-J. ; Fuess, H. (2012):
Bimodal domain configuration and wedge formation in tetragonal Pb Zr1-XTiX O-3.
In: Acta Crystallographica A: Foundations and Advances, 68, p. 244. International Union of Crystallography (IUCr) and Wiley, DOI: 10.1107/s0108767312095256,
[Article]

Hoffmann, M. J. ; Kungl, H. ; Theissmann, R. ; Wagner, S.
Heywang, W. ; Lubitz, K. ; Werding, W. (eds.) (2008):
Microstructural Analysis Based on Microscopy and X-Ray Diffraction.
In: Springer Series in Materials Science, 114, In: Piezoelectricity. Evolution and Future of a Technology., pp. 403-421, Springer Verlag Berlin Heidelberg, ISBN 978-3-540-68680-4,
[Book Section]

Vetrano, J. S. ; Kleebe, H.-J. ; Hampp, E. ; Hoffmann, M. J. ; Rühle, M. ; Cannon, R. M. (1993):
Yb2O3-Fluxed Sintered Silicon Nitride, Part 1 Microstructure Characterization.
In: Journal of Materials Science, 28 (13), pp. 3529-3538. Springer Nature, DOI: 10.1007/bf01159834,
[Article]

Vetrano, J. S. ; Kleebe, H.-J. ; Hampp, E. ; Hoffmann, M. J. ; Cannon, R. M. (1992):
Epitaxial Deposition of Silicon-Nitride During Post-Sintering Heat-Treatment.
In: Journal of Materials Science Letters, 11 (18), pp. 1249-1252. Springer, DOI: 10.1007/BF00729782,
[Article]

Kleebe, H.-J. ; Hoffmann, M. J. ; Rühle, M. (1992):
Influence of Secondary Phase Chemistry on Grain-Boundary Film Thickness in Silicon-Nitride.
In: International Journal of Materials Research = Zeitschrift für Metallkunde, 83 (8), pp. 610-617. de Gruyter, DOI: 10.1515/ijmr-1992-830808,
[Article]

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