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Influence of Secondary Phase Chemistry on Grain-Boundary Film Thickness in Silicon-Nitride

Kleebe, H.-J. ; Hoffmann, M. J. ; Rühle, M. (1992):
Influence of Secondary Phase Chemistry on Grain-Boundary Film Thickness in Silicon-Nitride.
In: International Journal of Materials Research = Zeitschrift für Metallkunde, 83 (8), pp. 610-617. de Gruyter, DOI: 10.1515/ijmr-1992-830808,
[Article]

Item Type: Article
Erschienen: 1992
Creators: Kleebe, H.-J. ; Hoffmann, M. J. ; Rühle, M.
Title: Influence of Secondary Phase Chemistry on Grain-Boundary Film Thickness in Silicon-Nitride
Language: English
Journal or Publication Title: International Journal of Materials Research = Zeitschrift für Metallkunde
Journal volume: 83
Number: 8
Publisher: de Gruyter
Divisions: 11 Department of Materials and Earth Sciences
11 Department of Materials and Earth Sciences > Earth Science
11 Department of Materials and Earth Sciences > Earth Science > Geo-Material-Science
Date Deposited: 17 Nov 2021 12:07
DOI: 10.1515/ijmr-1992-830808
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