Artikel

Gottwald, P. ; Kräutle, H. ; Szentpali, B. ; Hartnagel, H. L. (2001)
Results on passivation of InP by photo-CVD SiO2 and SiNx obtained by using the low-frequency noise measurement technique.
In: Fluctuation and noise letters, 1
Artikel, Bibliographie

Gottwald, P. ; Kräutle, H. ; Szentpali, B. ; Kincses, Zs. ; Hartnagel, H. L. (1997)
Damage characterization of InP after reactive ion etching using the low-frequency noise measurement technique.
In: Solid state electronics, 41 (4)
doi: 10.1016/S0038-1101(96)00224-9
Artikel, Bibliographie

Konferenzveröffentlichung

Böttner, Th. ; Kräutle, H. ; Kuphal, E. ; Miethe, K. ; Hartnagel, H. L. (1996)
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
International Conference on Indium Phosphide and Related Materials. Schwäbisch Gmünd (8.1996)
Konferenzveröffentlichung, Bibliographie